Formation of High energy White Synchrotron Microbeam and its Application to Micro-Imaging of Electronic Devices

随着第三代同步辐射光源的发展，微束技术变得越来越重要。在KB镜或二维非对称晶体反射的微束中，目前的微孔微束具有能量高、光谱呈白色且平行等特点。本研究成功地获得了直径为5 μ m的微束，并将其应用于电子器件中单个缺陷如位错微缺陷的显微成像观察，对锗单晶的观察清晰地显示了位错，其对比度和分辨率均优于传统的白色束形貌仪。目前的研究表明，高能白色平行微束在X射线散射形貌成像材料中的优势。此外，已经发现，在微孔处的聚焦效应提供了约3微米的光束直径，使得我们能够在利用高能白色和平行微束的现有扫描型器件的微成像中获得1微米的分辨率，否则是不可能的。

Microbeam techniques are becoming increasingly important with the recent development of third-generation synchrotron light sources. The present microbeam with microhole among various type of microbeam such as those by KB mirror or two-dimensional asymmetric crystal-reflection has unique characteristics ; high energy, white spectrum and being parallel. In the present research project 5 micrometers diameter microbeam has been successfully attained and applied to the observation of micro-imaging of individual defects such dislocation microdefects in electronic devices.The observation of a Germanium single crystal clearly revealed dislocations with better contrast and resolution than in a conventional white beam topograph. The present research has shown advantages of a high energy white and parallel microbeam in materials-imaging by X-ray scattering topography. Besides the imaging system equipped with an energy sensitive multi-channel detecting system has provided a function of local spectroscopy simultaneously.Besides It has been found that focusing effect at the microhole provides approximately 3 micrometer in beam diameter to enable us to attain one micrometer resolution in the present scanning type micro-imaging of devices which takes advantages of high energy white and parallel micro beam, otherwise impossible.