Plasma-Assist Effect on the Sputter-Deposition Process of Transparent Conductive Metal-doped Zinc Oxide Thin Films

氧化锌（ZnO）是一种环境友好、成本低廉、很有前途的透明导电材料，可替代目前广泛使用的氧化铟锡（ITO）。采用电感耦合等离子体辅助磁控溅射法制备了掺铝氧化锌（AZO）透明导电薄膜。采用ICP辅助沉积法成功地制备了高透过率、低电阻率的AZO薄膜。

Zinc oxide (ZnO) is an environmentally-friendly, low-cost and promising transparent conductive material to replace indium tin oxide (ITO) which has been widely-used so far. Inductively coupled plasma assisted magnetron sputtering has been applied for the deposition of transparent conductive aluminum-doped zinc oxide (AZO) thin films. Good quality AZO thin films with high transmittance and low resistivity have been successfully obtained by the assist with ICP.