Advanced studies to functionalize the inner wall of microfluidic channels by atmospheric-pressure μplasmas

采用μ等离子体增强化学气相沉积技术，在低气压下在同一芯片上的窄管或微通道内壁上制备了二氧化钛和二氧化硅薄膜。用X射线光电子能谱、红外光谱和扫描电子显微镜对薄膜的化学性质和表面形貌进行了分析。通过施加0.4T以上的强磁场来控制电子温度，在微通道内产生了磁化的He和Arμ等离子体。此外，使用脉冲电晕μ等离子体对商品聚合物微流控芯片的微通道壁进行表面修饰，经等离子体处理的微通道具有高度的亲水性。

TiO_2 and SiO_2 thin films were prepared on the inner wall of narrow tubes or microchannels on a chip by μ plasma-enchanced chemical vapor deposition at low～atmospheric pressure. The chemical properties and surface morphology of the deposited films were analyzed by X-ray photoelectron spectroscopy, infrared spectroscopy and scanning electron microscopy. Magnetized He and Ar μ plasmas were generated inside the microchannels by applying a strong magnetic field of more than 0.4 T to control an electron temperature. Furthermore, a pulsed corona μ plasma was used to modify the surfaces of microchannel walls of commercial polymer microfluidic chips and the plasma-treated microchannels exhibited highly hydrophilic properties.