Clarification and Emergence of Self-replication Phenomena in Microelectronic Materials

为了制造一批多点细凸起（突出电极）作为电子器件的基本电极结构，采用了自形成方法。通过CCD相机的微光学记录，观察了微熔滴在金属电极上的润湿行为，并对微熔滴自形成过程的适宜条件进行了形态评价。

In order to make a batch of multi-point fine bumps (protruding electrodes) as the fundamental electrode structure of electronic devices, self-formation method was conducted. With a micro optical recording by a CCD camera, the observation of the wetting behavior of fine molten droplets on metal electrodes and morphological evaluation of bumps were conducted for the proper condition of the self-formation process.