Development of carbon stripper foils for J-PARC Accelerators
Development of carbon stripper foils for J-PARC Accelerators
批准号:
21540305
负责人:
MUTO Hideshi
金额:
$3.08万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
十多年来,我们用重离子束溅射方法研制出了厚度为1.2μg/cm~2的超长寿命碳剥离膜。这种厚度的薄片主要用于100-200keV/u的重离子束。最近,高能负质子和重离子加速器开始使用厚度超过100μg/cm~2的碳剥离薄片。然而,重离子束溅射方法不能成功地制备厚度大于50μg/cm~2的薄膜,这是因为在溅射过程中碳颗粒从衬底上崩塌下来。重现率低于25%。收到的碳箔样品存在表面缺陷。然而,通过在溅射过程中引入衬底加热器来消除这些缺陷。在这份手稿中,我们描述了一种重复性很强的方法,即用氪和氙气溅射重离子束来制备厚碳剥离箔。
英文摘要
For over a decade, we have developed super long-lived carbon stripper foils of 1.20μg/cm2 thickness by the heavy ion beam sputtering method. Foils of this thickness are mainly used for heavy ion beams of 100-200 keV/u. Recently, high energy negative proton and heavy ion accelerators have started to use carbon stripper foils of over 100μg/cm2 in thickness. However, the heavy ion beam sputtering method was unsuccessful in production of foils thicker than 50μg/cm2 as resulted in the collapse of carbon particles from substrates during sputtering process. The reproduction probability was less than 25%. The samples of the carbon foil received had surface defects. However, the defects were eliminated by introduction of a substrate heater during sputtering process. In this manuscript we describe a highly reproducible method for thick carbon stripper foils by a heavy ion beam sputtering with krypton and xenon gases.
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Proceedings of the 22nd International Conference on the Application of Accelerator in Research and Industry(CAARI2012)
第22届国际加速器研究与工业应用会议论文集(CAARI2012)
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[H. Muto, Y. Ohshiro, M. Oyaizu, K. Kawasaki and T. Hattori]
通讯作者:
K. Kawasaki and T. Hattori
Evaluation of carbon stripper foils produced by a nitrogen ion beam sputtering method
氮离子束溅射法生产的碳剥离箔的评价
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[H. Muto, M. Oyaizu, K. Kawasaki and T. Hattori]
通讯作者:
K. Kawasaki and T. Hattori
Microstructure of long-lived carbon stripper foils
长寿命碳剥离箔的微观结构
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[H. Muto, M. Oyaizu, K. Kawasaki and T. Hattori]
通讯作者:
K. Kawasaki and T. Hattori
Ion beam sputtering and its applications
离子束溅射及其应用
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[H. Muto, M. Oyaizu, K. Kawasaki and T. Hattori]
通讯作者:
K. Kawasaki and T. Hattori
海外基金