Development of Total reflection zone plate for hard x-ray nanofocusing

我们研制的“全反射带片”具有更高的x射线聚焦潜力，比一般的x射线聚焦装置更容易制造。在线聚焦型无量纲聚焦中，设计并制作了理论聚焦尺寸优于5 nm的器件。它实现了x射线聚焦，尺寸优于20纳米，效率高于我们之前开发的。将两个线聚焦型器件串联在一起，也可以获得尺寸大于50 nm的点聚焦。我们提出了其他二维聚焦装置为点聚焦型。通过计算研究揭示了它在x射线聚焦中的高电位能力。研究了点聚焦型光源的制备工艺。最后，成功地制作了一个使用部分圆柱形衬底的原型器件。

We developed "Total-reflection zone plate" which has higher potential ability in x-ray focusing with easier fabrication than general x-ray focusing devices. In line-focusing type for on-dimensional focusing, devices with the theoretical focusing size better than 5 nm were designed and fabricated. And it achieved x-ray focusing with the size better than 20 nm and with higher efficiency than we previously developed. A point focusing with the size better than 50 nm also could be obtained by using two line-focusing type devices arranged in tandem. We proposed other two-dimensional focusing devices as point-focusing type. The high potential abilities in x-ray focusing were revealed using calculation studies. The fabrication process for the point-focusing type was studied. Finally, a prototype device using a partial cylindrical substrate was successfully fabricated.