Study on nano machining technology using fullerenol molecules

将富勒烯醇溶液与胶体硅浆料混合形成新型的功能细颗粒，用于蓝宝石CMP的应用。通过使用新型功能细颗粒，蓝宝石CMP的材料去除率（MRR）高于传统的胶体硅浆料。在这种情况下，MRR随着混合料浆中C60(OH)n浓度的增加而增加。在这种情况下，MRR随C60(OH)n浓度的变化受蓝宝石衬底表面形貌的影响。富勒烯醇分子如C60(OH)n n=ca。DLS和Raman结果表明，10种胶体二氧化硅颗粒被吸附在细小颗粒上。根据DLS的峰移，我们估计在胶体二氧化硅颗粒周围包裹了2层C60(OH)n分子。由于吸附过程中C60(OH)n分子在拉曼光谱上的峰移位，C60(OH)n分子可能与胶体二氧化硅颗粒形成弱键。

Novel functional fine particles are formed by mixing fullerenol solution and colloidal silica slurry for applying sapphire CMP. Material removal rate (MRR) of the sapphire CMP become higher than conventional colloidal silica slurry by using novel functional fine particles. In this cases, the MRR increases as the concentration of the C60(OH)n in the mixed slurry become higher. The variation of MRR against concentration of the C60(OH)n is effected by surface morphology of the sapphire substrate in this case.The fullerenol molecules such as C60(OH)n n=ca.10 are adsorbed on the colloidal silica particles for the fine particle by DLS and Raman results. From the peak shift of the DLS, we estimate that 2 layers of C60(OH)n molecules is coated around the colloidal silica particles. C60(OH)n molecules might be weakly bonded with the colloidal silica particle because the peak assigned as C60(OH)n molecules shift by the adsorption process on the Raman spectra.