Power supply infrastructure for a pulsed water-wall arc lamp

Mattson Technology开发了一种水墙涡流弧光灯技术，该技术可用于闪光辅助快速热处理（fRTP）和硅晶片表面的快速加热。晶圆加热用于许多不同的应用，包括超浅结的创建，缺陷退火和NiPtSi相变。为了完成这项任务，需要四个灯，其电流脉冲可以在时间上交错并适当地成形。每盏灯的电流曲线都经过优化，以满足以下双重标准：恒定的温度和最小的晶圆振动。每个灯由多个电源供电，然而每个灯的电源基础设施是相似的;一个电源用于点燃灯，第二个电源用于维持和斜坡灯中的电流，第三个电源用于将灯脉冲到超过10，000 A的电流，持续大约毫秒的时间段。

Mattson Technology has developed a water wall vortex arc lamp technology which can be used for flash assisted rapid thermal processing (fRTP) and the rapid heating of a silicon wafer surface. Wafer heating is used for a number of different applications including the creation of ultra-shallow junctions, defect annealing, and NiPtSi phase changes. Four lamps whose current pulses can be staggered in time and shaped appropriately are required to accomplish this task. The current profiles of each lamp have been optimized to meet the following dual criteria; constant temperature and minimal wafer vibrations. Each of the lamps is powered by a number of power supplies however the power supply infrastructure for each lamp is similar; one power supply is used to ignite the lamp, a second power supply is used to sustain and ramp the current in the lamp, and a third power supply is used to pulse the lamp to currents which are in excess of 10,000 A for a period in the order of milliseconds.