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Atomic Layer Deposition of Nanodevices for Electrochemical Energy Devices

Atomic Layer Deposition of Nanodevices for Electrochemical Energy Devices
用于电化学能源器件的纳米器件的原子层沉积
批准号:
RGPIN-2019-05206
负责人:
Kao, Emmeline
金额:
$1.97万
依托单位:
依托单位国家:
加拿大
项目类别:
Discovery Grants Program - Individual
财政年份:
2019
资助国家:
加拿大
项目状态:
已结题
起止时间:
2019-01-01 至 2020-12-31

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中文摘要
翻译
我的研究项目提出了一种制造电化学储能器件的全新的创新方法:原子层沉积(ALD)。ALD提供了提供可扩展的集成设备的能力,而不会牺牲纹理化。我的团队将通过使用单一的ALD工艺在高活性的纳米结构基板上结合多层电极和电解液来制造固态集成设备。这项技术有可能颠覆电化学储能生产的现状,开辟新的研究途径,并为储能领域具有商业可行性的科学进步铺平道路。*ALD是一种薄膜沉积技术,即使在高度不规则的结构上也能达到ngström级的精度。在典型的双前驱体循环中,两个气体前体相继脉冲,以实现自限能反应,导致最终材料的单层,一次沉积一个原子层。重复这个循环,可以精确地控制薄膜的生长速度,使其达到1个/周期的数量级。ALD无与伦比的精度和一致性使其成为实现我的目标的理想工具:创新的、可推广的大规模生产纳米结构电化学储能(EES)设备。*我的目标是通过ALD制造EES的以下短期目标来实现这一目标:(I)高度可调的钙钛矿型固态离子传输氧化物;(Ii)通过高度织构的纳米结构衬底(阴极和电解液的集成)最小限度地限制器件设计,以获得更长的寿命;以及(Iii)通过高效的配方技术和空间设计实现高通量的ALD。这三项研究每一项都带来了能源储存领域以外丰富、有前景的潜在应用领域。因此,这些研究重点中的每一个方面的成就都对各种领域具有广泛的当代影响,如薄膜、用于光伏、LED、光电子学和半导体器件的精密钙钛矿生产。*如果成功,这些进展将有可能改变能源储存生产,并为进入商业市场的能源储存科学进步开辟新的途径。这样做将弥合MEMS储能设备和大规模电力系统之间的差距,允许使用完全封装的分布式但集中存储的智能能源电网。ALD功能多样且可靠,可在强大的电网存储方案中整合多种能量存储机制:电池可缓解高需求间歇期的能量短缺,而超级电容器凭借其卓越的功率密度,可用于实现调峰和平滑。最后,ALD的高精度和保形涂层使其具有比当前可扩展能量存储所能实现的显著更高的性能。
英文摘要
My research program proposes an entirely novel and innovative approach to manufacturing electrochemical energy storage devices: Atomic Layer Deposition (ALD). ALD offers the ability to deliver scalable integrated devices with no sacrifice in texturization. My group will fabricate solid-state, integrated devices by using a single ALD process to incorporate layers of electrodes and electrolytes on highly active, nanostructured substrates. This technology threatens to upend the status quo in electrochemical energy storage production, opening up new research avenues and paving the road for commercially viable scientific advances in energy storage. ******ALD is a thin-film deposition technique capable of ngström-level precision even over highly irregular structures. In a canonical two-precursor cycle, two gaseous precursors are pulsed one after another to enable a self-limiting reaction, resulting in a single layer of final material that has been deposited one atomic layer at a time. Repeating this cycle allows for precisely controlled films with growth rates on the order of 1 /cycle. ALD's unrivaled precision and conformality make it the ideal tool for my goal: innovative, generalizable mass production of nanostructured electrochemical energy storage (EES) devices. ******I aim to achieve this goal by focusing on the following short-term objectives for EES fabrication via ALD: (I) highly tunable, perovskite-based, solid-state ion-transport oxides; (II) minimally constrained device design for longer lifetimes via highly texturized nanostructured substrates (integration of cathode and electrolyte); and (III) high-throughput ALD through efficient recipe techniques and spatial design. These three research thrusts each bring fields of rich, promising potential applications aside outside of the energy storage realm. Achievement in each of these research focuses thus offers broad-reaching, contemporary implications for fields as diverse as thin-films, precise perovskite production for photovoltaics, LEDs, optoelectronics, and semiconductor devices.******If successful, these advances carry the potential to transform energy storage production and open up new avenues for scientific advances in energy storage that reach the commercial market. Doing so will bridge the gap between MEMS energy storage devices and large-scale power systems, allowing for smart energy grids with fully packaged distributed, yet centralized storage. Versatile and reliable, ALD can incorporate multiple energy storage mechanisms in a robust grid storage scheme: a battery may alleviate shortages during intermittent periods of high demand, while supercapacitors, with their superior power density, could be used to implement peak shaving and smoothing. Finally, the highly precise and conformal coating of ALD enables potential for significantly higher performance than current scalable energy storage can achieve.
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Atomic Layer Deposition of Nanodevices for Electrochemical Energy Devices
  • 批准号:
    RGPIN-2019-05206
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $1.97万
  • 财政年份:
    2020
  • 负责人:
    Kao, Emmeline
  • 依托单位:
Atomic Layer Deposition of Nanodevices for Electrochemical Energy Devices
  • 批准号:
    DGECR-2019-00247
  • 项目类别:
    Discovery Launch Supplement
  • 资助金额:
    $0.91万
  • 财政年份:
    2019
  • 负责人:
    Kao, Emmeline
  • 依托单位:
国内基金
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  • 项目类别:
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  • 批准年份:
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  • 项目类别:
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  • 资助金额:
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  • 批准年份:
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