The Fabrication of Multicomponent Oxide Films by Computer- Controlled Dual Ion Beam Sputter Deposition

这项研究的目的是研究利用计算机控制的双离子束溅射沉积超导和铁电薄膜。这一不断发展的新技术应该能够沉积高质量的多组分氧化物(不限于氧化物)薄膜，其化学计量比受到严格控制，具有均匀或调制/超晶格结构，并在与集成器件工艺兼容的条件下(例如，低温)。将对薄膜的结构、化学和电学性质进行详细的表征。

The objective of this proposed research is to investigate the deposition of superconducting and ferroelectric thin films via computer controlled dual ion beam sputter deposition. This new and evolving technology should allow deposition of high quality, multi-component oxide (not limited to oxides) films with carefully controlled stoichiometries, with homogeneous or modulated/superlattice structures, and under conditions (e.g., low temperatures) compatible with integrated device processing. Detailed characterization of the structure, chemistry, and electrical properties of the films will be done.