The Fabrication of Multicomponent Oxide Films by Computer- Controlled Dual Ion Beam Sputter Deposition

计算机控制双离子束溅射沉积多组分氧化膜

• 批准号: 8807367
• 负责人: Angus Kingon
• 金额: $ 44.84万
• 依托单位: North Carolina State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1989
• 资助国家: 美国
• 起止时间: 1989-02-15 至 1992-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8807367&HistoricalAwards=false
• 关键词: Fabrication; Multicomponent; Oxide; Films; Computer

The objective of this proposed research is to investigate the deposition of superconducting and ferroelectric thin films via computer controlled dual ion beam sputter deposition. This new and evolving technology should allow deposition of high quality, multi-component oxide (not limited to oxides) films with carefully controlled stoichiometries, with homogeneous or modulated/superlattice structures, and under conditions (e.g., low temperatures) compatible with integrated device processing. Detailed characterization of the structure, chemistry, and electrical properties of the films will be done.

这项研究的目的是调查 超导和铁电薄膜的沉积 通过计算机控制的双离子束溅射沉积。 这 新的和不断发展的技术应允许沉积高 高质量的多组分氧化物（不限于氧化物）膜， 仔细控制化学计量，均匀或 调制/超晶格结构，并且在一定条件下（例如， 低温）与集成器件处理兼容。 详细表征结构、化学性质和 将完成膜的电性能。