The Fabrication of Multicomponent Oxide Films by Computer- Controlled Dual Ion Beam Sputter Deposition

这项研究的目的是调查 超导和铁电薄膜的沉积 通过计算机控制的双离子束溅射沉积。 这 新的和不断发展的技术应允许沉积高 高质量的多组分氧化物（不限于氧化物）膜， 仔细控制化学计量，均匀或 调制/超晶格结构，并且在一定条件下（例如， 低温）与集成器件处理兼容。 详细表征结构、化学性质和 将完成膜的电性能。

The objective of this proposed research is to investigate the deposition of superconducting and ferroelectric thin films via computer controlled dual ion beam sputter deposition. This new and evolving technology should allow deposition of high quality, multi-component oxide (not limited to oxides) films with carefully controlled stoichiometries, with homogeneous or modulated/superlattice structures, and under conditions (e.g., low temperatures) compatible with integrated device processing. Detailed characterization of the structure, chemistry, and electrical properties of the films will be done.