Transparent Conductive Multicomponent Oxide Thin Films with High Stability for High Temperature Use
Transparent Conductive Multicomponent Oxide Thin Films with High Stability for High Temperature Use
批准号:
09650035
负责人:
MINAMI Tadatsugu
金额:
$2.18万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
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英文摘要
A number of transparent conductive oxide (TCO) films consisting of binary compounds such as ZnO, In_20_3 and SnO_2 ternary compounds such as Zn_2In_2O_5, In_4Sn_30_<12>, GaIn0_3, ZnSn0_3, and MgIn_2O_4 and multicomponent oxides composed of combinations of binary compounds or ternary compounds were tested for stability in various atmospheres at high temperatures. The TCO films were prepared by magnetron sputtering on quartz substrates at room temperature or 350゚C and tested in air, argon gas or a vacuum at temperatures up to 1000゚C.Concerning the stability of their electrical properties, SnO_2, SnO_2 : Sb and In_4Sn_30_<12> films prepared at 350゚C were stable in air at temperatures up to 900゚C.TCO films such as In_20_3, ITO, SnO_2, SnO_2 : Sb and In_4Sn_30_<12> were stable in an Ar gas atmosphere at temperatures up to 900゚C.The stability of multicomponent oxide films was controlled by changing the composition of films. In partictular, the stability was improved as the Sn content in TCO films was increased, but it was decreased as the Zn, Mg and/or Ga contents were increased. The resistivity increase found in TCO films that contained Zn was attributed to grain boundary scattering resulting from oxygen adsorption. As a result, the chemical stability at high temperatures was mainly determined by the metal elements contained in the TCO film ; high stability was exhibited in TCO films rich in Sn.
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T.Minami, T.Miyata and T.Yamamoto: "Stability of transparent conducting oxide films for use at high temperatures" J.Vac.Sci.Technol.A17(in press). (1999)
T.Minami、T.Miyata 和 T.Yamamoto:“高温下使用的透明导电氧化物薄膜的稳定性”J.Vac.Sci.Technol.A17(印刷中)。
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通讯作者:
T.Minami: "Transparent conducting multicomponent oxide thin films prepared by magnetron sputtering" J.Vac.Sci.Technol.(in press). (1999)
T.Minami:“通过磁控溅射制备透明导电多组分氧化物薄膜”J.Vac.Sci.Technol.(印刷中)。
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T.Minami, K.Shimokawa, T.Miyata: "P-type transparent conducting In_2O_3-Ag_2O thin films prepared by rf magnetron sputtering" J.Vac.Sci.Technol.A. 16(3)(in press). (1998)
T.Minami、K.Shimokawa、T.Miyata:“通过射频磁控溅射制备 P 型透明导电 In_2O_3-Ag_2O 薄膜” J.Vac.Sci.Technol.A。
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T.Minami, K.Shimokawa and T.Miyata: "P-type transparent conducting In_2O_3-Ag_2O thin films prepared by rf magnetron sputtering" J.Vac.Sci.Technol.A16, 3. 1218-1221 (1998)
T.Minami、K.Shimokawa 和 T.Miyata:“通过射频磁控溅射制备 P 型透明导电 In_2O_3-Ag_2O 薄膜” J.Vac.Sci.Technol.A16, 3. 1218-1221 (1998)
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T.Minami, T.Miyata and T.Yamamoto: "Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering" Surface and Coatings Techol.108-109. 583-587 (1998)
T.Minami、T.Miyata 和 T.Yamamoto:“磁控溅射制备的透明导电多组分氧化物薄膜的功函数”Surface and Coatings Techol.108-109。
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共 11 条
Super high luminance blue emitting phosphor thin film for EL devices prepared by combinatorial sputtering
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批准号:21560728
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.0万
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财政年份:2009
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负责人:MINAMI Tadatsugu
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依托单位:
The study of Y_2O_3-based Oxide Phosphor Thin Film Electroluminescent Devices
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批准号:15560037
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
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财政年份:2003
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负责人:MINAMI Tadatsugu
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依托单位:
Preparation of an inorganic thin film electroluminescent devices using gallium oxide phosphor
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批准号:13650047
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.56万
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财政年份:2001
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负责人:MINAMI Tadatsugu
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依托单位:
Property Control of the Multicomponent Oxide Transparent Conducting Thin Films
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批准号:11650033
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.3万
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财政年份:1999
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负责人:MINAMI Tadatsugu
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依托单位:
Theoretical and experimental studies on conducting transparent thin films to obtain highly trasparent films with low sheet resistance
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批准号:60550014
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1985
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负责人:MINAMI Tadatsugu
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依托单位:
海外基金