Arbitrary Concentration Surface Alloys Using Ion Implantation

离子注入已被广泛用于制备新型非平衡表面合金和新化合物的埋藏层。该方法在商业上用于一系列需要减少磨损和腐蚀的材料。然而，由于靶表面的快速溅射所施加的基本限制，许多理想的允许浓度组合已被发现是不可能获得的。本文研究了一种离子注入重金属的新方法，该方法通常在10-15%的浓度下由于溅射而饱和，到任意高浓度（接近100%）。该技术有效地消除了1/S的浓度理论限制。该技术将在高性能、超纯表面合金中得到广泛应用。

Ion implantation has been widely used to produce novel non- equilibrium surface alloys and buried layers of new compounds. The method is used commercially for a range of materials requiring wear and corrosion reduction. However, many desirable combinations of allow concentrations have been found to be impossible to obtain due to fundamental limitations imposed by rapid sputtering of the target surface. A novel method is examined here to ion implant heavy metals, which usually saturate at 10-15% concentration due to sputtering, to arbitrarily high concentration (approaching 100%). This technique effectively eliminates the 1/S theoretical limit on concentration. The technology will have numerous applications in high performance, ultra-pure surface alloys.