Reactive Coating of Carbides by Simultaneous Ion Bombardment and Material Deposition

由于没有方便的碳离子源，用传统的反应束辅助碳化物硬件很难在低温下进行碳化物的反应束辅助涂层(IBAD)。碳化物是非常有用的涂层材料，具有优异的硬度，在碳化硅的情况下，具有出色的抗氧化性。如果除高温化学沉积或溅射之外有更多的沉积技术，碳化物涂层将得到更广泛的商业应用。提出了一种产生特别适合于碳化物的反应IBAD涂层的强低能碳离子束的方法。一般技术将使用碳化硅涂层进行演示。

Reactive beam assisted coating (IBAD) of carbides at low temperatures is difficult with conventional IBAD hardware because no convenient ion source of carbon exists. Carbides are very useful coating materials with superior hardness properties and in the case of SiC, exceptional oxidation resistance. Carbide coating would be more widely used commercially if more deposition techniques other than high temperature chemical deposition or sputtering were available. A method is proposed to produce an intense low energy ion beam of carbon that is particularly well suited for reactive IBAD coating of carbides. The general technique will be demonstrated using a Silicon carbide coating.