Acquisition of Instrumentation to Support of Interdisciplinary Research in Plasma Manufacturing of Thin Film Coatings and Electronic Materials

收购仪器以支持薄膜涂层和电子材料等离子制造的跨学科研究

• 批准号: 9413727
• 负责人: Jes Asmussen
• 金额: $ 20万
• 依托单位: Michigan State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-09-01 至 1997-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9413727&HistoricalAwards=false
• 关键词: Acquisition; Instrumentation; Support; Interdisciplinary; Research

9413727 Asmussen Plasma assisted processing of thin films has been identifed as an important, emerging manufacturing technology for producing wear, heat, and corrosion resistant surfaces and for the fabrications of electronic and photonic materials. In order to achieve the commercialization of these plasma processes, intelligently controlled, user-friendly plasma manufacturing technology must be developed. One class of plasma machines that have exhibited great potential to address many plasma assisted manufacturing problems are microwave plasma reactor systems. Their electrodeless nature together with their ability to create high densities of excited and charged species have made both high-pressure and low-pressure discharges an attractive technology for many plasma processing applications. Past and ongoing research by the investigators and others has demostrated the potential of these microwave plasma machines in the commercial manufacturing of hard thin film coatings and electronic and photonic materials. Of particular note, are the microwave processing applications related to diamond thin film deposition and the processing of silicon and III-V electronic and photonic materials. Building upon these past successes, their research activities described in this proposal are concerned with the continued development, optimization, and intelligent control of this important manufacturing technology. The proposed work will be carried out in the Electronics and Surface Properties of Materials (ESPM) Center Laboratories at Michigan State University. In the Center, microwave plasma machines and associated plasma processes are being developed by an interdisciplinary group of engineering faculty. Thus, the requested instrumentation will augment an already very active research laboratory and will allow ESPM Center research activities to more rapidlly expand into new materials characterization technologies, process optimizations, and plasma process control, and will enhance ongoing research in plasm a machine development, modeling, and diagnosis. In particular, the requested equipment will provide the instrumentation needed for new, specific plasma process development and optimization activities, will provide additional computer resources for plasma machine modeling and reactor control efforts, will enable new and strengthen ongoing materials and microstructure characterization efforts, and will provide instrumentation required for the recently initiated plasma process control activities. Finally, requested instrumentation will allow plasma machine development to proceed into new creative direction. A substantial fraction of the requested equipment funding is for instrumentation for new ESPM Center efforts and will aid new Center faculty members with their instrumentation needs. Thus, it is expected that this request will greatly improve the Center's research capability on intelligent process control, plasma process development, and materials characterization techniques. The requested laboratory instruments represent and important addition to the capabilities of the ESPM Laboratories and it will allow the Center to more effectively perform its interdisciplinary research and education missions.

9413727亚斯穆森等离子体辅助薄膜加工已被确认为一种重要的新兴制造技术，用于生产耐磨、耐热和耐腐蚀的表面，并用于电子和光子材料的制造。为了实现这些等离子体工艺的商业化，必须开发智能控制、用户友好的等离子体制造技术。微波等离子体反应堆系统是一类显示出解决许多等离子体辅助制造问题的巨大潜力的等离子体机器。它们的无电极特性，以及它们能够产生高密度的激发和带电物种，使高压和低压放电成为许多等离子体处理应用的一项有吸引力的技术。研究人员和其他人过去和正在进行的研究表明，这些微波等离子设备在硬薄膜涂层以及电子和光子材料的商业制造中具有潜力。特别值得注意的是与金刚石薄膜沉积以及硅和III-V电子和光子材料的加工有关的微波处理应用。在这些过去成功的基础上，他们在本提案中描述的研究活动涉及这一重要制造技术的持续开发、优化和智能控制。拟议的工作将在密歇根州立大学的电子和材料表面性质(ESPM)中心实验室进行。在该中心，一个由工程教员组成的跨学科小组正在开发微波等离子体机器和相关的等离子体工艺。因此，所要求的仪器将加强已经非常活跃的研究实验室，并将使ESPM中心的研究活动更快地扩展到新材料表征技术、工艺优化和等离子工艺控制，并将加强等离子体机器开发、建模和诊断方面的正在进行的研究。特别是，所要求的设备将提供新的、具体的等离子工艺开发和优化活动所需的仪器，将为等离子机器建模和反应堆控制工作提供额外的计算机资源，将使新的和加强正在进行的材料和微结构表征工作成为可能，并将为最近启动的等离子工艺控制活动提供所需的仪器。最后，所要求的仪器设备将使等离子机器的开发进入新的创造性方向。所需设备资金的很大一部分是用于新的ESPM中心的仪器设备，并将帮助新的中心教职员工满足他们的仪器设备需求。因此，预计这一要求将极大地提高该中心在智能过程控制、等离子体过程开发和材料表征技术方面的研究能力。所要求的实验室仪器是对ESPM实验室能力的重要补充，它将使中心能够更有效地履行其跨学科研究和教育任务。