NSF/ONR: Growth of High Temperature Superconducting Thin Films and Heterostructure Interfaces

本研究的主要科学目的是阐明高温超导体薄膜和异质结构的沉积、成膜和界面反应机制。为了实现这一目标，将利用飞行时间离子散射和反冲光谱和光谱椭偏技术对高温超导体薄膜和异质结构的成膜和相互作用进行现场实时分析。预计该研究项目不仅将为高温超导体和铁电薄膜及异质结构的形成和界面反应提供大量信息，而且还将为实现完全集成的飞行时间离子散射和反冲光谱、光谱椭偏、离子束溅射沉积系统为这些复杂材料和结构的制备提供必要的知识。

9422182 Irene The principal scientific objective of the research is to elucidate the mechanisms of deposition, film formation and interface reactions for high temperature superconductor films and heterostructures. In order to accomplish this objective two complimentary techniques, namely time of flight ion scattering and recoil spectroscopy and spectroscopic ellipsometry will be used for in-situ real time analysis of the film formation and interactions of the high temperature superconductor films and heterostructures. It is anticipated that this research program will not only produce considerable information about the formation and interface reactions of high temperature superconductor and ferroelectric films and heterostructures, but also the knowledge necessary to implement a fully integrated time of flight ion scattering and recoil spectroscopy, spectroscopic ellipsometry, ion beam sputter-deposition system for the preparation of these complex materials and structures.