GOALI: In-Situ Real-Time Studies of Complex Oxide Thin Film Processes and Interfaces

该GOALI项目的重点是对复杂氧化物薄膜的成分、结构和性能进行原位实时研究，以优化薄膜质量，并开发优化所需薄膜性能的薄膜形成模型。 一个独特的过程和表征系统相结合的光谱椭圆偏振和低能离子散射，以及多目标离子束溅射沉积系统的薄膜生长正在完成。 这个涉及系统开发的GOALI项目不仅需要北卡罗来纳州大学和詹姆斯麦迪逊大学（本科院校）和阿贡国家实验室提供的各种科学人才，而且还需要工业硬件实施阶段的工业参与。具有复杂成分和结构的氧化物薄膜正在考虑用于下一代电子和光学器件。 目前强调的材料类别包括高度优化的超导体薄膜、高介电常数薄膜、铁电体和压电体。 工业界将培训学生以获得这些领域的就业机会视为高度优先事项。

This GOALI project focuses on in-situ, real-time studies of complex oxide thin film composition, structure, and properties to be used to optimize film quality and to develop film formation models that optimize desired film properties. A unique process and characterization system combining spectroscopic ellipsometry and low energy ion scattering, together with a multi target ion beam sputter deposition system for film growth is being completed. This GOALI project involving systems development requires not only the diverse scientific talents provided by the University of North Carolina and James Madison University (an undergraduate institution) and Argonne National laboratories, but also industrial participation for the industrial hardware implementation phase.Oxide films with both complex compositions and structures are being considered for the next generation electronic and optical devices. Among the classes materials currently being emphasized are highly optimized thin films of superconductors, high dielectric constant dielectrics, ferroelectrics and piezoelectrics. Training students for job opportunities in these areas is regarded as a high priority by industry.