Inorganic and Organic Thin Film and Interface Studies

本项目体现了对电子/光子学中具有技术意义的无机和有机界面的基础材料科学研究。基于先前的研究结果，主要关注Si氧化和氮化的关键微电子反应，以及二氧化硅覆盖的Si上的有机聚合物膜聚邻甲氧基苯胺（POMA），本研究扩展到包括与高介电常数(K)绝缘体、铁电体和压电体相关的复杂无机氧化物界面。并将选择的p型半导体有机薄膜与稳定的n型有机半导体相结合，以制造和表征由新型界面制成的原型器件结构。材料科学的基本问题是了解界面反应的性质和程度，然后评估界面的化学/物理性质对界面电子特性的影响，这些特性是由表征良好的界面确定的。研究策略是通过现场实时椭偏仪和其他现场实时表征方法实时跟踪界面形成的演变，以提供化学成分、结构和光学性质的评估。界面敏感表征技术，如光谱浸泡椭偏，分形分析，和福勒-诺德海姆隧道电流振荡将包括在内。将采用几种界面和薄膜制备工艺：热溅射和离子溅射用于无机界面，化学和电化学溶液方法用于有机薄膜。该项目涉及材料科学中具有高技术相关性的主题领域的基础研究问题。该研究课题，特别是与高介电常数和铁电材料形成的界面，以及有机电子材料的新兴领域，对纳米电子学的未来发展至关重要。该项目的一个重要特点是通过在一个基础和技术上重要的领域培养学生，将研究和教育结合起来。这项研究活动在与工业相关的研究领域为研究生、本科生和博士后提供培训。这项研究的参与者包括来自北卡罗来纳大学和詹姆斯麦迪逊大学的大学生（拥有ROA的B. Augustine教授）、国家实验室合作者（ANL的O. Auciello博士）和一个小企业主（Ionwerks Inc.的a . Schultz博士）。参与者分享他们不同的观点，学生在不同的专业环境中获得经验，研究成果可以很容易地在工业和政府中实施。学生还将能够参与在ANL正在进行的新的国家纳米材料中心（CNM）进行的研究。PI已经成功地从代表性不足的群体中招募和毕业学生，并将继续这样做。预计所有参与的学生将在其学位期间在国际会议上发表演讲，并在国际期刊上发表几篇论文

This project embodies a fundamental materials science study of inorganic and organic interfaces that have technological significance in electronics/photonics. Building on results of previous studies that focused on key microelectronics reactions of oxidation and nitridation of Si and the organic polymer film poly o-methoxyaniline (POMA) on SiO2 covered Si, this research is extended to include complex inorganic oxide interfaces that have relevance for high dielectric constant (K) insulators, and for ferroelectrics and piezoelectrics, and to combine selected organic films that are p-type semiconductors with stable n-type organic semiconductors to fabricate and characterize prototype device structures made from novel interfaces. The fundamental materials science issue is to understand the nature and extent of interface reactions and then to assess the impact of the chemical/physical nature of the interface with resultant interfacial electronic properties as determined from well-characterized interfaces. The research strategy is to follow the evolution of interface formation in real time via in situ real-time ellipsometry as well as other situ real-time characterization methodologies to provide assessments of chemical composition, structure and optical properties. Interface sensitive characterization techniques such as spectroscopic immersion ellipsometry, fractal analysis, and Fowler-Nordheim tunnel current oscillations will be included. Several interface and thin film preparation processes will be utilized: thermal, and ion sputtering for inorganic interfaces and chemical and electrochemical solution methods for organic films. %%% The project addresses basic research issues in a topical area of materials science with high technological relevance. The research topic, specifically interfaces formed with high dielectric constant and ferroelectric materials, and the emerging field of organic electronic materials is critical to future progress in nanoscale electronics. An important feature of the project is the integration of research and education through the training of students in a fundamentally and technologically significant area. This research activity provides training of graduate and undergraduate students and post doctorals in an industrially relevant area of research. The research is collaborative with participants that include university students from the University of North Carolina and James Madison University (Prof. B. Augustine with an ROA), national laboratory collaborator (Dr. O. Auciello at ANL), and a small business owner (Dr. A. Schultz of Ionwerks Inc.). Participants share their differing perspectives, students get experience in different professional environments, and research results can be readily implemented in industry and government. Students will also be able to participate in research conducted in the new National Center for Nanomaterials (CNM) in progress at ANL. The PI has successfully recruited and graduated students from underrepresented groups, and will continue to do so. It is anticipated that all participating students will have made presentations at international meetings during their degree time and will have published several papers in refereed international journals.***