U.S.-France Cooperative Research: Plasma Processes in Microelectronics Materials Preparation

点击翻译按钮获取中文摘要

This three-year award supports cooperative research on plasma processes in microelectronic materials between Eugene Irene of the University of North Carolina and Bernard Agius of the University of Paris (South), Orsay, France. Plasmas are used extensively for the preparation of thin films for application in microelectronic devices. In this proposal the investigators will study the mechanisms for changes in plasmas during film growth and surface preparation and develop methods for modifying plasmas in order to optimize desirable properties and minimize damage during preparation of thin films. Using techniques developed at the University of North Carolina, the U.S. investigator will focus on the evolution of plasma damage processes, in particular, those properties which produce damage, and the procedures which minimize damage. Samples will be prepared and characterized using ECR (Electron Cyclotron Resonance). Characterization of these materials will be performed simultaneously at both Orsay and North Carolina. The project will benefit from these combined efforts, the redundant experiments and the complementary facilities. This research will advance our knowledge about plasma processes and its relationship to the production of very thin films. The results of this research will be important to the development of high performance electronic devices.