Advanced Kinetic Methods for Efficient Modeling of Low Pressure Discharges
Advanced Kinetic Methods for Efficient Modeling of Low Pressure Discharges
批准号:
9713137
负责人:
Uwe Kortshagen
金额:
$25.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1997
资助国家:
美国
项目状态:
已结题
起止时间:
1997-09-01 至 2001-08-31
中文摘要
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英文摘要
ABSTRACT Proposal Number: ECS-9713137 Principal Investigator: Uwe Kortshagen Title: Advanced kinetic methods for efficient modeling of low pressure discharges In this research, mathematical methods to describe the electron kinetics in the intermediate regime between low neutral densities and high neutral densities will be developed. The low pressure discharges used for plasma processing fall into the intermediate regime and there are currently no existing models which are accurate for this regime. The methods developed will be rigorously checked against Monte Carlo simulations, and against experiments.
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批准号:1502461
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财政年份:2015
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批准号:1407903
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财政年份:2014
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依托单位:
Conference: 2010 Gordon Research Conference and Gordon Kenan Research Seminar on Plasma Processing Science: July 11-16, 2010 in New London, NH
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批准号:1019137
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项目类别:Standard Grant
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资助金额:$1.5万
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财政年份:2010
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负责人:Uwe Kortshagen
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依托单位:
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批准号:0903842
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项目类别:Standard Grant
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资助金额:$10.0万
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财政年份:2009
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负责人:Uwe Kortshagen
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依托单位:
Student and Participant Support for the 2008 Gordon Research Conference on Plasma Processing Science (GRC-PPS-2008)
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批准号:0821077
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项目类别:Standard Grant
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资助金额:$2.0万
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财政年份:2008
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依托单位:
Solar Cells from Silicon and Germanium Nanocrystals Inks
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批准号:0756326
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资助金额:$28.5万
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财政年份:2008
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负责人:Uwe Kortshagen
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Scaleable High-Yield Plasma Production of Functionalized Semiconductor Nanocrystals
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批准号:0556163
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财政年份:2006
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批准号:0500332
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依托单位:
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批准号:0229123
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资助金额:$0.5万
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批准号:0114372
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资助金额:$0.0万
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财政年份:2001
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依托单位:
CAREER: Photodetachment from Nanometer-Sized Particles
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资助金额:$20.0万
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依托单位:
Contaminant Particle Formation in Radio Frequency Silane Plasmas
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依托单位:
国内基金
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依托单位:
带奇性的 Kinetic Cucker-Smale 模型在随机环境中的平均场极限及时间渐近行为研究
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批准年份:2005
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负责人:郑小平
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依托单位: