Modeling, Design & Control of Electromagnetic Systems with Permanent-Electro-Magnet Combinations and its Application to the Development of a High Performance Magnetic Suspen
Modeling, Design & Control of Electromagnetic Systems with Permanent-Electro-Magnet Combinations and its Application to the Development of a High Performance Magnetic Suspen
批准号:
9713701
负责人:
Chia-Hsiang Menq
金额:
$15.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1997
资助国家:
美国
项目状态:
已结题
起止时间:
1997-10-01 至 2001-09-30
中文摘要
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英文摘要
This research project deals with the development of an integrated methodology for modeling, design and control of electromagnetic systems. An approach to developing this integrated methodology consist of two basic components: Development of a modeling and design strategy for the electromagnet actuation scheme using Permanent-ElectroMagnet (PEM) combinations that support the large travel and the high stiffness performance requirements, and the formulation of a discrete time, robust nonlinear control architecture that guarantees ultra precision tracking performance under external disturbances and plant variations. This tight coupling between the design of the electromagnetic actuation scheme and that of the control architecture ensures that the entire system responds at the stringent performance levels demanded of it. Results from this project provide a clear methodology for designing electromagnetic actuation schemes given a set of performance requirements; improve the understanding of nonlinear, discrete time control in the context of high performance electromechanical systems; and enable technology that is essential for the development of magnetic suspension actuators. By adding PEM combination, the research project enhances the capabilities of the large travel Magnetic Suspension Actuator currently under development at the Coordinate Metrology and Measurement Laboratory at Ohio State University. It leads to a system that addresses the high performance actuation requirements of the precision engineering industry for a range of applications such as photolithography, semiconductor wafer inspection, free-form precision machining and non-circular turning.
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