The Fabrication and Physical Properties of Integrated Metal and Semiconductor Nanocrystal Systems

这个FRG/GOALI项目是多学科的，涉及化学、物理、工程和材料科学的要素。加州大学洛杉矶分校和加州大学洛杉矶分校的教授A. Paul Alivisatos和James R. Heath正在与惠普实验室的R. Stanley Williams合作。该项目的目的是为纳米晶体（NC）和纳米晶体阵列（NCA）器件的演示和发展奠定基础，首先开发适合器件应用的纳米基薄膜合成技术，并通过理解和优化NC/x接口的特性。各种潜在的应用，从荧光粉到光伏到电子开关和存储设备，都被设想为这些材料。这种方法涉及两个方面。首先是将纳米晶体和纳米晶体组件集成到技术相关环境中的技术发展。第二个是开发集成系统如何运行的物理图像。将发展纳米晶集成系统的化学制造技术及结构特性研究。它们的光学性质将用时间和频率分辨光谱来研究。通过集成NC和NCA系统进行的温度依赖电子传输、光伏和电容测量将使用电子束光刻产生的触点进行。将花费特别的精力来控制和描述这些不同系统中的接口。该项目由四个NSF项目和MPS OMA（多学科活动办公室）共同支持。该项目涉及具有高技术相关性的科学和工程跨学科领域的前沿研究问题。这项研究将在基础层面上为材料和器件的重要方面提供基础知识，并将为设计和生产未来器件的改进材料和结构提供更好的理解和基础。该计划的一个重要特点是通过培养学生在一个基础和技术上重要的领域的研究和教育的整合。* * *

9726597 Alivisatos This FRG/GOALI project is multidisciplinary, involving elements of Chemistry, Physics, Engineering and Materials Science. Professors A. Paul Alivisatos and James R. Heath at UCB and UCLA, respectively, are collaborating with R. Stanley Williams at Hewlett-Packard Laboratories. The aim of the project is to lay the groundwork for the demonstration and the development of nanocrystal(NC) and nanocrystal array(NCA) based devices by first developing techniques for synthesis of NC-based thin films appropriate for device applications, and by understanding and optimizing the properties of NC/x interfaces. A variety of potential applications, ranging from phosphors to photovoltaics to electronic switching and storage devices, are envisioned for these materials. The approach involves two aspects. The first is the development of techniques for integrating nanocrystals and nanocrystal assemblies into technologically relevant environments. The second is the development of a physical picture of how the integrated systems operate. Chemical techniques for fabricating nanocrystal integrated systems and examining their structural characteristics will be developed. Their optical properties will be interrogated with time and frequency resolved spectroscopies. Temperature dependent electron transport, photovoltaic, and capacitance measurements through integrated NC and NCA systems will be carried out using contacts produced by electron-beam lithography. Particular effort will be spent on controlling and characterizing the interfaces in these various systems. The project is co-supported by four NSF programs, and the MPS OMA(Office of Multidisciplinary Activities). %%% This project addresses forefront research issues in an interdisciplinary area of science and engineering having high technological relevance. The research will contribute basic knowledge at a fundamental level to important aspects of materials and devices, and will provide improved understanding and a basis for designing and producing improved materials and structures for devices of the future. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area. ***