U. S. - France (INRIA) Cooperative Research Improving the Efficiency of Manufacturing Systems by Integrating Production Control into Maintenance Policies

00070866这个为期三年的美法合作运筹学奖由马里兰大学的Michael Fu、法国国家计算机科学与工程研究所(INRIA)的谢晓兰和Nidhal Rezg获得。研究合作的目的是开发基于分析和模拟的模型，以解决某些类型的制造系统的可靠性和操作性能，特别是半导体制造设施。与其他类型的制造系统不同，半导体设施中操作不确定性的主要来源是机器的停机时间。因此，预防性维护对有效运行至关重要。调查人员将开发理论模型，将生产计划数据或过程控制数据方面的系统状态信息考虑在内。目标是通过集成这些数据来提高运营性能并找到好的维护策略。该奖项代表了美国方面向NSF和法国国家计算机科学与工程研究所(INRIA)提出的联合建议。NSF将支付这名美国调查员和研究生的旅费和生活费。Inria将支持法国研究人员访问美国。这种合作是跨学科的。美国和法国的团队代表着制造设施设计、生产计划、运营和系统研究以及分析和基于模拟的模型方面的专业知识。这位美国调查人员在随机优化方面拥有专业知识。这与法国在制造系统建模和分析方面的专业知识相辅相成。该项目可能为提高半导体制造设施的盈利能力和可靠性提供新的模式。

00070866FuThis three-year award for U.S.-France collaboration in operations research involves Michael Fu of the University of Maryland, Xiaolan Xie and Nidhal Rezg of the French National Institute for Research in Computer Science and Engineering (INRIA) in Metz (Lorraine Province). The research collaboration is aimed at the development of analytical and simulation-based models that address the reliability and operational performance of certain types of manufacturing systems, in particular, semiconductor fabrication facilities. Unlike other types of manufacturing systems, the main sources of operational uncertainty in semiconductor facilities are the downtimes of machines. Thus, preventive maintenance is crucial for efficient operations. The investigators will develop theoretical models that take into account information from the state of the system in terms of production planning data or process control data. The goal is to improve operational performance and find good maintenance policy by integrating these data. This award represents the U.S. side of a joint proposal to the NSF and the French National Institute for Research in Computer Science and Engineering (INRIA). NSF will cover travel funds and living expenses of the U.S. investigator and graduate student. INRIA will support the French researchers' visits to the United States. The collaboration is interdisciplinary. U.S. and French teams represent expertise in manufacturing facility design, production planning, operations and systems research, and in both analytical and simulation-based models. The U.S. investigator has expertise in stochastic optimization. This is complemented by French expertise in modeling and analysis of manufacturing systems. The project could provide new models for improving profitability and reliability of semiconductor fabrication facilities.