Metal Boride Thin Films: Synthesis of CVD Precursors and Growth by Remote-Plasma CVD

该奖项由化学部门的先进材料和加工项目以及材料研究部门的电子材料项目颁发，以支持伊利诺伊大学厄巴纳-香槟分校的Gregory Girolami教授和John Abelson教授的工作。研究的重点是过渡金属和镧系硼氢化物配合物的合成，并利用远程氢等离子体辅助化学气相沉积技术将其沉积成薄膜。研究了薄层沉积的效率、机理以及所制备薄膜的物理性能。这些研究将为微电子集成电路中金属硼化物作为扩散屏障的体扩散特性和极限提供科学信息。此外，该研究还为学生提供了材料科学重要跨学科领域的培训。纯金属硼氢化物，只含有金属、硼和氢，正在被合成和表征。用气相沉积方法制备用于集成电子电路中作为阻挡材料的薄膜。此外，本项目的跨学科方法为学生提供了材料化学、合成、表征和薄膜沉积方面的知识和训练。从这些研究中获得的知识将在电子和光子器件集成电路的设计和制造中得到应用。

This award by the Advanced Materials and Processing Program in the Chemistry Division and the Electronic Materials Program in the Division of Materials Research supports the work of Professors Gregory Girolami and John Abelson of the University of Illinois Urbana-Champaign. The focus of the research is the synthesis of transition metal and lanthanide borohydride complexes and deposition of thin films from them using remote hydrogen-plasma-assisted chemical vapor deposition. The efficiency and mechanism of thin layer deposition and physical properties of the films prepared are being investigated. These studies will provide scientific information on bulk diffusion properties and limits of metal borides as diffusion barriers in microelectronic integrated circuits. In addition, the research provides training to students in an important interdisciplinary area of materials science.Pure metal borohydrides, which contain only the metal, boron, and hydrogen, are being synthesized and characterized. Thin films for applications in integrated electronic circuits as barrier materials are being prepared by vapor deposition methods. In addition, the interdisciplinary approaches of this project provide knowledge and training to students in materials chemistry, synthesis, characterization, and thin film deposition. The knowledge gained from these studies will have applications in the design and fabrication of integrated circuits for electronic and photonic devices.