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Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors

Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
批准号:
1954745
负责人:
Gregory Girolami
金额:
$49.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2020
资助国家:
美国
项目状态:
已结题
起止时间:
2020-05-15 至 2024-04-30

项目摘要

项目成果

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中文摘要
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英文摘要
Chemical vapor deposition (CVD) is a method to produce high quality, high-performance solid materials. For example, CVD is used by the semiconductor industry to form thin films of a variety of substances that are necessary for the functioning of many electronic devices. Since there is pervasive need for new types of films, there is a continuing demand for new compounds that can be used in CVD. To meet this need, Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign is supported by the Chemical Synthesis Program of the Chemistry Division of the National Science Foundation to develop new compounds that can be used to form films of metals and metal oxides. Metal compounds that become vapors when heated are prepared and their decomposition on heated surfaces evaluated. The goal is to design better ways to deposit the wires and insulators that are components of computer chips. The work involves cooperation between Professor Girolami’s research group and microelectronic companies, IBM and Intel. The project contributes to the education and training of a diverse group of undergraduate and graduate students. In addition Professor Girolami writes short radio spots (TinyTech) highlighting recent scientific advances of interest to the public. The development of new and better molecular precursors for the chemical vapor deposition (CVD) of thin films is a continuing need. This project prepares new volatile compounds of the transition metals, investigates their chemical reactivities, and utilities them as thin film precursors. Some of the objectives are the synthesis and characterization of complexes containing coordinating groups that bind to metals through oxygen, nitrogen, or boron-hydrogen bonds. Upon their synthesis, the new compounds are evaluated for the CVD preparations of thin films. A diverse group of undergraduate and graduate students are involved in the project that lies at the interface of inorganic and materials chemistry. Outreach activities involving the production and broadcast of TinyTech radio spots.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(14)
专著(0)
科研奖励(0)
会议论文
Sodium Aminodiboranates Na(H 3 BNR 2 BH 3 ): Structural and Spectroscopic Studies of Steric and Electronic Substituent Effects
氨基二硼酸钠 Na(H 3 BNR 2 BH 3 ):空间和电子取代基效应的结构和光谱研究
DOI: 10.1021/acs.inorgchem.2c01997
发表时间: 2022
期刊: Inorganic Chemistry
影响因子: 4.6
作者: [Caroff, Christopher M., Bellott, Brian J., Daly, Connor I., Daly, Scott R., Dunbar, Andrew C., Mallek, Justin L., Nesbit, Mark A., Girolami, Gregory S.]
通讯作者: Girolami, Gregory S.
Nature of the Short Rh–Li Contact between Lithium and the Rhodium ω-Alkenyl Complex [Rh(CH 2 CMe 2 CH 2 CH═CH 2 ) 2 ] −
短 Rh-Li 的性质 锂与铑 α-烯基配合物 [Rh(CH 2 CMe 2 CH 2 CH-CH 2 ) 2 ] 之间的接触
DOI: 10.1021/acs.inorgchem.1c00737
发表时间: 2021
期刊: Inorganic Chemistry
影响因子: 4.6
作者: [Liu, Sumeng, Smith, Brett A., Kirkland, Justin K., Vogiatzis, Konstantinos D., Girolami, Gregory S.]
通讯作者: Girolami, Gregory S.
Selective chemical vapor deposition of HfB 2 on Al 2 O 3 over SiO 2 and the acceleration of nucleation on SiO 2 by pretreatment with Hf[N(CH 3 ) 2 ] 4
SiO 2 上Al 2 O 3 选择性化学气相沉积HfB 2 及Hf[N(CH 3 ) 2 ] 4 预处理加速SiO 2 成核
DOI: 10.1116/6.0000691
发表时间: 2021
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Zhang, Zhejun V., Liu, Sumeng, Girolami, Gregory S., Abelson, John R.]
通讯作者: Abelson, John R.
Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors: Synthesis and Characterization of Pt[CH 2 CMe 2 CH 2 CH═CH 2 ] 2 and the Impact of Ligand Design on the Deposition Process
铂α-烯基化合物作为化学气相沉积前驱体:Pt[CH 2 CMe 2 CH 2 CH–CH 2 ] 2 的合成和表征以及配体设计对沉积过程的影响
DOI: 10.1021/acs.chemmater.0c03226
发表时间: 2020
期刊: Chemistry of Materials
影响因子: 8.6
作者: [Liu, Sumeng, Zhang, Zhejun, Gray, Danielle, Zhu, Lingyang, Abelson, John R., Girolami, Gregory S.]
通讯作者: Girolami, Gregory S.
14
    Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
    Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
    Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
    Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
    国内基金
    海外基金
    新型滤波器综合技术-直接综合技术(Direct synthesis Technique)的研究及应用
    • 批准号:
      61671111
    • 项目类别:
      面上项目
    • 资助金额:
      58.0万元
    • 批准年份:
      2016
    • 负责人:
      肖飞
    • 依托单位: