Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
批准号:
1665191
负责人:
Gregory Girolami
金额:
$48.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-07-01 至 2020-06-30
中文摘要
美国国家科学基金会化学部的化学合成计划支持Gregory S.伊利诺伊大学厄本那-香槟分校的Girolami博士合作,开发用于薄膜化学气相沉积(CVD)的新的更好的分子前体。 目前的工作将开发过渡金属化合物的新类别,特别是因为它们涉及使用这种分子作为前体,用于在具有深垂直特征的表面上沉积金属和金属氧化物。这项研究将使人们更好地了解挥发性过渡金属化合物的化学性质,以及如何利用它们均匀地填充这种深特征,重点是更好地存款电线和绝缘体,这些是现代计算机芯片的关键部件。 这项工作将加强教授吉罗拉米?集团和微电子开发领域的领先企业。该项目将直接促进学士学位的教育和培训。和博士研究结果将在国际会议上发表,并在著名的科学期刊上发表。 该奖项将有助于本科生和研究生的多样化群体的教育,并使吉罗拉米教授写简短的广播节目突出最近的科学进步感兴趣的公众。一个至关重要的国家科学需求是开发新的和更好的分子前体,用于薄膜的化学气相沉积(CVD)。目前的项目通过调查新的挥发性化合物(特别是过渡金属)的合成,调查其化学反应性,以及研究其挥发性和作为薄膜前体的效用,直接促进了这一需求。当前项目的一些具体目标是合成含有硬-软螯合配体的新络合物,以及合成高分子量但仍然高度挥发性的化合物,这些化合物预计可用于超共形薄膜的CVD。与此同时,将与这些技术的专家合作,对这些新化合物在薄膜CVD中的应用进行研究。这些新分子的开发将导致性能更好的材料和新的制造方法,这将使集成电路的持续小型化成为可能。通过这种方式,Girolami集团将为实现国际半导体技术路线图中最重要的“困难挑战”之一做出贡献:快速引入用于薄膜化学气相沉积(CVD)的新材料/工艺。该项目位于无机和材料化学的界面,非常适合各级科学家的教育。 吉罗拉米教授该集团也有能力为科学领域代表性不足的学生提供最高水平的教育和培训。 涉及制作和播放TinyTech电台节目的外联活动也将是资助项目的一部分。
英文摘要
The Chemical Synthesis Program of the Chemistry Division of NSF supports the project by Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign to develop new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current work will develop new classes of transition metal compounds, especially as they relate to the use of such molecules as precursors for the deposition of metals and metal oxides on surfaces with deep vertical features. The research will lead to a better understanding of the chemistry of volatile transition metal compounds and how they can be used to uniformly fill such deep features with a focus on better ways to deposit the wires and insulators that are key components of modern-day computer chips. The work will enhance already existing interactions between Professor Girolami?s group and leading companies in microelectronics development. This project will contribute directly to the education and training of B.S. and Ph.D. students, and the results will be disseminated by presentations at international conferences, and by publication in reputable scientific journals. This award will contribute to the education of a diverse group of undergraduate and graduate students, and enable Professor Girolami to write short radio spots highlighting recent scientific advances of interest to the public. A vital national scientific need is the development of new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current project is contributing directly to this need by investigating the synthesis of new volatile compounds (especially of the transition metals), investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are the synthesis of new complexes containing hard-soft chelating ligands, and the synthesis of high molecular weight but still highly volatile compounds, which are expected to be useful for the CVD of superconformal thin films. In parallel, investigations of the use of these new compounds for the CVD of thin films will be carried out collaboratively with experts in these techniques. The development of these new molecules will lead to better performing materials and new fabrication methods that will enable the continued miniaturization of integrated circuits. In this way, the Girolami group will contribute to achieving one of the most important "Difficult Challenges" of the International Technology Roadmap for Semiconductors: the rapid introduction of new materials/processes for the chemical vapor deposition (CVD) of thin films. The project lies at the interface of inorganic and materials chemistry, and is well suited for the education of scientists at all levels. Professor Girolami?s group is also well positioned to provide the highest level of education and training for students underrepresented in science. Outreach activities involving the production and broadcast of TinyTech radio spots will also be part of the funded project.
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Chemical vapor deposition of magnetic iron-cobalt alloy thin films: Use of ammonia to stabilize growth from carbonyl precursors
磁性铁钴合金薄膜的化学气相沉积:使用氨来稳定羰基前体的生长
DOI:
10.1116/1.5045671
发表时间:
2018
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Zhang, Pengyi, Zhang, Zhejun, Abelson, John R., Girolami, Gregory S.]
通讯作者:
Girolami, Gregory S.
Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxes
使用正向通量的化学气相沉积进行超保形涂层和深沟槽填充
DOI:
10.1116/1.5038100
发表时间:
2018
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Talukdar, Tushar K., Wang, Wenjiao B., Girolami, Gregory S., Abelson, John R.]
通讯作者:
Abelson, John R.
Low temperature chemical vapor deposition of superconducting vanadium nitride thin films
超导氮化钒薄膜的低温化学气相沉积
DOI:
10.1116/1.5088050
发表时间:
2019
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Mohimi, Elham, Zhang, Zhejun V., Mallek, Justin L., Liu, Sumeng, Trinh, Brian B., Shetty, Pralav P., Girolami, Gregory S., Abelson, John R.]
通讯作者:
Abelson, John R.
Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH 3
从八羰基二钴中对钴进行区域选择性化学气相沉积:通过添加 NH 3 共流增强介电-介电选择性
DOI:
10.1116/1.5144501
发表时间:
2020
期刊:
Journal of Vacuum Science & Technology A
影响因子:
2.9
作者:
[Zhang, Zhejun V., Liu, Sumeng, Girolami, Gregory S., Abelson, John R.]
通讯作者:
Abelson, John R.
DOI:
10.1021/acsnano.9b07244
发表时间:
2020-01-01
期刊:
ACS NANO
影响因子:
17.1
作者:
[Wang, Gang, Kim, Sung-Kon, Lyding, Joseph W.]
通讯作者:
Lyding, Joseph W.
共 15 条
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
-
批准号:1954745
-
项目类别:Standard Grant
-
资助金额:$49.5万
-
财政年份:2020
-
负责人:Gregory Girolami
-
依托单位:
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
-
批准号:1362931
-
项目类别:Continuing Grant
-
资助金额:$39.0万
-
财政年份:2014
-
负责人:Gregory Girolami
-
依托单位:
Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
-
批准号:1112360
-
项目类别:Continuing Grant
-
资助金额:$39.0万
-
财政年份:2011
-
负责人:Gregory Girolami
-
依托单位:
Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
-
批准号:0750422
-
项目类别:Continuing Grant
-
资助金额:$0.0万
-
财政年份:2008
-
负责人:Gregory Girolami
-
依托单位:
Student and Faculty Travel Grant: Broadening Participation in the Council for Chemical Research Annual Meeting 2006
-
批准号:0628935
-
项目类别:Standard Grant
-
资助金额:$2.84万
-
财政年份:2006
-
负责人:Gregory Girolami
-
依托单位:
Chemical Vapor Deposition of Metallic Films at Low Temperatures: Precursor Synthesis and Hydrogen-Assisted Reaction Chemistry
-
批准号:0420768
-
项目类别:Continuing Grant
-
资助金额:$60.53万
-
财政年份:2004
-
负责人:Gregory Girolami
-
依托单位:
Metal Boride Thin Films: Synthesis of CVD Precursors and Growth by Remote-Plasma CVD
-
批准号:0076061
-
项目类别:Continuing Grant
-
资助金额:$52.1万
-
财政年份:2000
-
负责人:Gregory Girolami
-
依托单位:
Homogeneous Models of Ziegler-Natta Catalysts
-
批准号:8917586
-
项目类别:Continuing Grant
-
资助金额:$21.3万
-
财政年份:1989
-
负责人:Gregory Girolami
-
依托单位:
Homogeneous Models of Ziegler-Natta Catalysts
-
批准号:8521757
-
项目类别:Continuing Grant
-
资助金额:$14.79万
-
财政年份:1986
-
负责人:Gregory Girolami
-
依托单位:
国内基金
海外基金
新型滤波器综合技术-直接综合技术(Direct synthesis Technique)的研究及应用
-
批准号:61671111
-
项目类别:面上项目
-
资助金额:58.0万元
-
批准年份:2016
-
负责人:肖飞
-
依托单位: