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Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors

Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
批准号:
1665191
负责人:
Gregory Girolami
金额:
$48.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-07-01 至 2020-06-30

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中文摘要
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英文摘要
The Chemical Synthesis Program of the Chemistry Division of NSF supports the project by Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign to develop new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current work will develop new classes of transition metal compounds, especially as they relate to the use of such molecules as precursors for the deposition of metals and metal oxides on surfaces with deep vertical features. The research will lead to a better understanding of the chemistry of volatile transition metal compounds and how they can be used to uniformly fill such deep features with a focus on better ways to deposit the wires and insulators that are key components of modern-day computer chips. The work will enhance already existing interactions between Professor Girolami?s group and leading companies in microelectronics development. This project will contribute directly to the education and training of B.S. and Ph.D. students, and the results will be disseminated by presentations at international conferences, and by publication in reputable scientific journals. This award will contribute to the education of a diverse group of undergraduate and graduate students, and enable Professor Girolami to write short radio spots highlighting recent scientific advances of interest to the public. A vital national scientific need is the development of new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current project is contributing directly to this need by investigating the synthesis of new volatile compounds (especially of the transition metals), investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are the synthesis of new complexes containing hard-soft chelating ligands, and the synthesis of high molecular weight but still highly volatile compounds, which are expected to be useful for the CVD of superconformal thin films. In parallel, investigations of the use of these new compounds for the CVD of thin films will be carried out collaboratively with experts in these techniques. The development of these new molecules will lead to better performing materials and new fabrication methods that will enable the continued miniaturization of integrated circuits. In this way, the Girolami group will contribute to achieving one of the most important "Difficult Challenges" of the International Technology Roadmap for Semiconductors: the rapid introduction of new materials/processes for the chemical vapor deposition (CVD) of thin films. The project lies at the interface of inorganic and materials chemistry, and is well suited for the education of scientists at all levels. Professor Girolami?s group is also well positioned to provide the highest level of education and training for students underrepresented in science. Outreach activities involving the production and broadcast of TinyTech radio spots will also be part of the funded project.
期刊论文(17)
专著(0)
科研奖励(0)
会议论文
Chemical vapor deposition of magnetic iron-cobalt alloy thin films: Use of ammonia to stabilize growth from carbonyl precursors
磁性铁钴合金薄膜的化学气相沉积:使用氨来稳定羰基前体的生长
DOI: 10.1116/1.5045671
发表时间: 2018
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Zhang, Pengyi, Zhang, Zhejun, Abelson, John R., Girolami, Gregory S.]
通讯作者: Girolami, Gregory S.
Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxes
使用正向通量的化学气相沉积进行超保形涂层和深沟槽填充
DOI: 10.1116/1.5038100
发表时间: 2018
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Talukdar, Tushar K., Wang, Wenjiao B., Girolami, Gregory S., Abelson, John R.]
通讯作者: Abelson, John R.
DOI: 10.1116/1.5088050
发表时间: 2019
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Mohimi, Elham, Zhang, Zhejun V., Mallek, Justin L., Liu, Sumeng, Trinh, Brian B., Shetty, Pralav P., Girolami, Gregory S., Abelson, John R.]
通讯作者: Abelson, John R.
Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH 3
从八羰基二钴中对钴进行区域选择性化学气相沉积:通过添加 NH 3 共流增强介电-介电选择性
DOI: 10.1116/1.5144501
发表时间: 2020
期刊: Journal of Vacuum Science & Technology A
影响因子: 2.9
作者: [Zhang, Zhejun V., Liu, Sumeng, Girolami, Gregory S., Abelson, John R.]
通讯作者: Abelson, John R.
15
    Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
    Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
    Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
    Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
    国内基金
    海外基金
    新型滤波器综合技术-直接综合技术(Direct synthesis Technique)的研究及应用
    • 批准号:
      61671111
    • 项目类别:
      面上项目
    • 资助金额:
      58.0万元
    • 批准年份:
      2016
    • 负责人:
      肖飞
    • 依托单位: