Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
具有新配体原型的挥发性过渡金属化合物:探索性合成、小分子反应性以及用作分子前体
基本信息
- 批准号:1112360
- 负责人:
- 金额:$ 39万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2011
- 资助国家:美国
- 起止时间:2011-08-15 至 2014-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this project funded by the Chemical Synthesis Program of the Chemistry Division, Professor Gregory S. Girolami of the Department of Chemistry of the University of Illinois will explore the synthesis of several classes of molecular precursors for electronic materials. The project involves the synthesis of new compounds, investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are the development of volatile two-coordinate amido complexes of the late transition elements, and mechanistic studies of dealkylation reactions that are relevant both to chemical vapor deposition (CVD) and to the chemistry of dialkylamide ligands. In parallel, investigations of new CVD precursors for both metal borides and metal oxides will be carried out, using a new class of chelating borohydride ligands of the general formula NR2(BH3)2-. The broader impacts involve training undergraduate students, graduate students, and postdoctoral researchers, and broadening participation through the inclusion of researchers from underrepresented groups on the project. This work could lead to the development of better molecular precursors for chemical vapor deposition (CVD) and atomic layer deposition (ALD) growth of thin films. Such chemistry will have an impact on critical problems in the microelectronics industry, and could lead to faster and more capable microprocessors for computers and other electronic equipment. In addition, this project will provide excellent training of students, from pre-undergraduate to post-doctoral, including those from groups historically underrepresented in the sciences.
在这个由化学系化学合成计划资助的项目中,伊利诺伊大学化学系的格雷戈里·S·吉罗拉米教授将探索几类电子材料分子前体的合成。该项目包括新化合物的合成,它们的化学反应活性的研究,以及它们作为薄膜前体的挥发性和用途的研究。目前项目的一些具体目标是开发后过渡元素的挥发性双配位氨基配合物,以及与化学气相沉积(CVD)和二烷基酰胺配体化学有关的脱烷基化反应的机理研究。同时,将使用通式为NR2(BH3)2-的一类新的螯合硼氢化物配体,对金属硼化物和金属氧化物的新的CVD前体进行研究。更广泛的影响包括培训本科生、研究生和博士后研究人员,并通过纳入该项目代表性不足群体的研究人员来扩大参与。这项工作可以开发出更好的用于化学气相沉积(CVD)和原子层沉积(ALD)生长薄膜的分子前驱体。这种化学将对微电子行业的关键问题产生影响,并可能导致用于计算机和其他电子设备的更快、更强大的微处理器。此外,该项目将为学生提供极好的培训,从本科前到博士后,包括那些在科学界历来代表性不足的学生。
项目成果
期刊论文数量(0)
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科研奖励数量(0)
会议论文数量(0)
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Gregory Girolami其他文献
Correction to: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching
- DOI:
10.1007/s11090-018-9882-6 - 发表时间:
2018-04-03 - 期刊:
- 影响因子:2.500
- 作者:
Daniel T. Elg;Gianluca A. Panici;Sumeng Liu;Gregory Girolami;Shailendra N. Srivastava;David N. Ruzic - 通讯作者:
David N. Ruzic
Gregory Girolami的其他文献
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{{ truncateString('Gregory Girolami', 18)}}的其他基金
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
- 批准号:
1954745 - 财政年份:2020
- 资助金额:
$ 39万 - 项目类别:
Standard Grant
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
- 批准号:
1665191 - 财政年份:2017
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
- 批准号:
1362931 - 财政年份:2014
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
薄膜化学气相沉积新型分子前体的合成及表面催化剂和抑制剂的开发
- 批准号:
0750422 - 财政年份:2008
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Student and Faculty Travel Grant: Broadening Participation in the Council for Chemical Research Annual Meeting 2006
学生和教师旅费补助:扩大对 2006 年化学研究理事会年会的参与
- 批准号:
0628935 - 财政年份:2006
- 资助金额:
$ 39万 - 项目类别:
Standard Grant
Chemical Vapor Deposition of Metallic Films at Low Temperatures: Precursor Synthesis and Hydrogen-Assisted Reaction Chemistry
低温金属薄膜化学气相沉积:前驱体合成和氢辅助反应化学
- 批准号:
0420768 - 财政年份:2004
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Metal Boride Thin Films: Synthesis of CVD Precursors and Growth by Remote-Plasma CVD
金属硼化物薄膜:CVD 前体的合成和远程等离子体 CVD 生长
- 批准号:
0076061 - 财政年份:2000
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Homogeneous Models of Ziegler-Natta Catalysts
齐格勒-纳塔催化剂的均相模型
- 批准号:
8917586 - 财政年份:1989
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Homogeneous Models of Ziegler-Natta Catalysts
齐格勒-纳塔催化剂的均相模型
- 批准号:
8521757 - 财政年份:1986
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
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职业生涯:克服过渡金属氧化物热电势和电导率之间的权衡
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