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Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors

Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
批准号:
1362931
负责人:
Gregory Girolami
金额:
$39.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2014
资助国家:
美国
项目状态:
已结题
起止时间:
2014-08-01 至 2018-07-31

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中文摘要
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英文摘要
With this award from the Chemical Synthesis (SYN) Program of the Chemistry Division of NSF, Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign will develop new and better molecular precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) of thin films. The current work will develop new classes of transition metal compounds, especially as they relate to the use of such molecules as precursors for the deposition of metal diborides, metal nitrides, and metal oxides. The work will enhance already existing interactions between Professor Girolami's group and leading companies in microelectronics development. The research will lead to deeper understandings of the chemistry of volatile transition metal compounds, and could lead to better ways to deposit the wires and insulators that are key components of modern-day computer chips. In addition, the award will contribute to the education of a diverse group of undergraduate and graduate students, and allow Professor Girolami to maintain his involvement in various services and outreach activities, such as library exhibits of rare books illustrating the history and advancement of science. The proposed activity is aimed toward the synthesis of new volatile compounds (especially of the transition metals), investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are synthesis of new two-coordinate complexes of the late transition elements, and the chemical tuning of ligands to change the volatility, reducing power, and deposition activation energies of their complexes in a systematic way. In parallel, investigations of the use of these new CVD precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) will be carried out collaboratively with experts in these techniques.
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Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
国内基金
海外基金
新型滤波器综合技术-直接综合技术(Direct synthesis Technique)的研究及应用
  • 批准号:
    61671111
  • 项目类别:
    面上项目
  • 资助金额:
    58.0万元
  • 批准年份:
    2016
  • 负责人:
    肖飞
  • 依托单位: