Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
基本信息
- 批准号:1362931
- 负责人:
- 金额:$ 39万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2014
- 资助国家:美国
- 起止时间:2014-08-01 至 2018-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
With this award from the Chemical Synthesis (SYN) Program of the Chemistry Division of NSF, Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign will develop new and better molecular precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) of thin films. The current work will develop new classes of transition metal compounds, especially as they relate to the use of such molecules as precursors for the deposition of metal diborides, metal nitrides, and metal oxides. The work will enhance already existing interactions between Professor Girolami's group and leading companies in microelectronics development. The research will lead to deeper understandings of the chemistry of volatile transition metal compounds, and could lead to better ways to deposit the wires and insulators that are key components of modern-day computer chips. In addition, the award will contribute to the education of a diverse group of undergraduate and graduate students, and allow Professor Girolami to maintain his involvement in various services and outreach activities, such as library exhibits of rare books illustrating the history and advancement of science. The proposed activity is aimed toward the synthesis of new volatile compounds (especially of the transition metals), investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are synthesis of new two-coordinate complexes of the late transition elements, and the chemical tuning of ligands to change the volatility, reducing power, and deposition activation energies of their complexes in a systematic way. In parallel, investigations of the use of these new CVD precursors for the chemical vapor deposition (CVD) and atomic layer deposition (ALD) will be carried out collaboratively with experts in these techniques.
伊利诺伊大学香槟分校的Gregory S.Girolami教授获得了美国国家科学基金会化学部化学合成(SYN)计划颁发的这一奖项,他将为薄膜的化学气相沉积(CVD)和原子层沉积(ALD)开发新的更好的分子前驱体。目前的工作将开发新的过渡金属化合物类别,特别是当它们与使用这些分子作为沉积金属二硼化物、金属氮化物和金属氧化物的前体有关时。这项工作将加强吉罗拉米教授的团队与微电子开发领域的领先公司之间已经存在的互动。这项研究将加深对挥发性过渡金属化合物化学的理解,并可能带来更好的沉积电线和绝缘体的方法,这些电线和绝缘体是现代计算机芯片的关键部件。此外,该奖项将有助于对不同的本科生和研究生群体的教育,并使Girolami教授能够继续参与各种服务和外联活动,例如图书馆展示说明科学历史和进步的珍稀书籍。建议的活性旨在合成新的挥发性化合物(特别是过渡金属),研究它们的化学反应活性,并研究它们的挥发性和作为薄膜前体的用途。目前项目的一些具体目标是合成新的后过渡元素双配位络合物,并对配体进行化学调整,以系统地改变其络合物的挥发性、还原功率和沉积活化能。同时,将与这些技术方面的专家合作,研究将这些新的CVD前体用于化学气相沉积(CVD)和原子层沉积(ALD)。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Gregory Girolami其他文献
Correction to: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching
- DOI:
10.1007/s11090-018-9882-6 - 发表时间:
2018-04-03 - 期刊:
- 影响因子:2.500
- 作者:
Daniel T. Elg;Gianluca A. Panici;Sumeng Liu;Gregory Girolami;Shailendra N. Srivastava;David N. Ruzic - 通讯作者:
David N. Ruzic
Gregory Girolami的其他文献
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{{ truncateString('Gregory Girolami', 18)}}的其他基金
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
- 批准号:
1954745 - 财政年份:2020
- 资助金额:
$ 39万 - 项目类别:
Standard Grant
Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors
挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途
- 批准号:
1665191 - 财政年份:2017
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Volatile Transition Metal Compounds with New Ligand Archetypes: Exploratory Synthesis, Small Molecule Reactivity, and Use as Molecular Precursors
具有新配体原型的挥发性过渡金属化合物:探索性合成、小分子反应性以及用作分子前体
- 批准号:
1112360 - 财政年份:2011
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Synthesis of New Molecular Precursors and Development of Surface Catalysts and Inhibitors for the Chemical Vapor Deposition of Thin Films
薄膜化学气相沉积新型分子前体的合成及表面催化剂和抑制剂的开发
- 批准号:
0750422 - 财政年份:2008
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Student and Faculty Travel Grant: Broadening Participation in the Council for Chemical Research Annual Meeting 2006
学生和教师旅费补助:扩大对 2006 年化学研究理事会年会的参与
- 批准号:
0628935 - 财政年份:2006
- 资助金额:
$ 39万 - 项目类别:
Standard Grant
Chemical Vapor Deposition of Metallic Films at Low Temperatures: Precursor Synthesis and Hydrogen-Assisted Reaction Chemistry
低温金属薄膜化学气相沉积:前驱体合成和氢辅助反应化学
- 批准号:
0420768 - 财政年份:2004
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Metal Boride Thin Films: Synthesis of CVD Precursors and Growth by Remote-Plasma CVD
金属硼化物薄膜:CVD 前体的合成和远程等离子体 CVD 生长
- 批准号:
0076061 - 财政年份:2000
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Homogeneous Models of Ziegler-Natta Catalysts
齐格勒-纳塔催化剂的均相模型
- 批准号:
8917586 - 财政年份:1989
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
Homogeneous Models of Ziegler-Natta Catalysts
齐格勒-纳塔催化剂的均相模型
- 批准号:
8521757 - 财政年份:1986
- 资助金额:
$ 39万 - 项目类别:
Continuing Grant
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