Student Travel for 2nd International Conference on Cat-CVD (Hot Wire CVD); Denver, CO

关于Cat-CVD(热线CVD)处理的会议http://www.nrel.gov/cat-cvd2/将于2002年9月10日至13日在美国科罗拉多州丹佛市举行。会议的目标是提供一个讨论的论坛，以评估和了解Cat-CVD(热线CVD)工艺沉积硅和其他薄膜相关材料的过程，解决与沉积相关的工艺问题，并研究可能导致这一快速成熟技术的工业应用的新应用。该计划以研讨会形式组织，为设备工程师、固态物理学家和材料科学家提供跨学科论坛，通过邀请和贡献的演示文稿正式讨论共同感兴趣的主题，并在包括海报演示会议在内的各种活动中非正式地讨论共同感兴趣的主题。目标是促进研究人员社区之间的交流，解决热线CVD工艺及其与技术的关系。各种学科背景--化学、物理、工程和材料科学--代表了会议的知识内容，并对其作出了积极贡献。随着评估该领域和未来方向的机会，预计将在大学、政府研究机构和行业之间建立新的联系。%评估热线CVD处理和相关设备问题的进展和现状，以及对最重要的发展的当前评估，将对理解和加强电子材料在计算、数据处理和通信中的利用具有重要价值。为了促进和维持这类技术的发展，吸引年轻研究人员和学生的支持、热情和兴趣至关重要。为此目的，将按顺序举行会议，并作出特别努力，确保在非正式情况下进行信息交流。硅领域的顶尖科学家已经承诺参加这次会议，因此在Cat-CVD方面具有各种经验的研究人员之间将有机会进行互动。***

A conference on Cat-CVD (Hot-Wire CVD) Processing, http://www.nrel.gov/cat-cvd2/ , will be held in Denver, CO September 10-13, 2002. The conference objective is to provide a forum for discussion to assess and understand the deposition of Si and other thin film related materials by the Cat-CVD (Hot-Wire CVD) process, to address deposition related processing issues, and investigate new applications which may lead to industrial utilization of this rapidly maturing technology. The program is organized as a workshop-style conference to provide an interdisciplinary forum for device engineers, solid state physicists, and materials scientists to discuss topics of common interest both formally through invited and contributed presentations, and informally during a variety of events including a poster presentation session. Objectives are to stimulate communications among the community of researchers addressing Hot-Wire CVD Processing and its relationship to technology. A variety of disciplinary backgrounds-chemistry, physics, engineering and materials science, is represented and contrributes positively to the intellectual content of the Conference. Along with the opportunity to assess the field and future directions, it is expected that new ties will be established between universities, government research institutions, and industry.%%%An evaluation of the progress and status of Hot-Wire CVD Processing and related device issues along with current assessments of the most important developments will be of significant value to the understanding and enhanced utilization of electronic materials in computing, data processing, and communications. To promote and sustain the growth of such technologies, it is vital to attract the support, enthusiasm, and interest of young researchers and students. To this end, sessions will be held sequentially, and special efforts made to ensure information exchange in an informal setting. Leading scientists in the Si field have committed to attend the conference, so there will be opportunity for interactions between researchers of all levels of experience in Cat-CVD. ***