Student Travel for 2nd International Conference on Cat-CVD (Hot Wire CVD); Denver, CO

关于Cat-CVD（热线CVD）加工的会议，http://www.nrel.gov/cat-cvd2/，将于2002年9月10-13日在科罗拉多州丹佛举行。会议的目的是提供一个讨论论坛，以评估和了解通过Cat-CVD（热线CVD）工艺沉积Si和其他薄膜相关材料，解决沉积相关的加工问题，并研究可能导致工业利用这一迅速成熟的技术的新应用。该计划组织为研讨会式会议，为器件工程师，固态物理学家和材料科学家提供跨学科论坛，讨论共同感兴趣的主题，正式通过邀请和贡献的演讲，以及非正式的各种活动，包括海报展示会议。目的是促进研究人员之间的交流，解决热线CVD加工及其与技术的关系。各种学科背景——化学、物理、工程和材料科学——都有代表，并对会议的知识内容作出了积极贡献。除了评估领域和未来方向的机会外，预计还将在大学、政府研究机构和产业界之间建立新的联系。对热线CVD加工和相关器件问题的进展和现状的评估，以及对当前最重要发展的评估，将对理解和增强电子材料在计算、数据处理和通信中的利用具有重要价值。为了促进和维持这些技术的发展，吸引年轻研究人员和学生的支持、热情和兴趣至关重要。为此目的，各届会议将依次举行，并将作出特别努力，确保在非正式场合交换资料。Si领域的主要科学家已经承诺参加会议，因此将有机会在Cat-CVD的各个经验水平的研究人员之间进行互动。＊＊＊

A conference on Cat-CVD (Hot-Wire CVD) Processing, http://www.nrel.gov/cat-cvd2/ , will be held in Denver, CO September 10-13, 2002. The conference objective is to provide a forum for discussion to assess and understand the deposition of Si and other thin film related materials by the Cat-CVD (Hot-Wire CVD) process, to address deposition related processing issues, and investigate new applications which may lead to industrial utilization of this rapidly maturing technology. The program is organized as a workshop-style conference to provide an interdisciplinary forum for device engineers, solid state physicists, and materials scientists to discuss topics of common interest both formally through invited and contributed presentations, and informally during a variety of events including a poster presentation session. Objectives are to stimulate communications among the community of researchers addressing Hot-Wire CVD Processing and its relationship to technology. A variety of disciplinary backgrounds-chemistry, physics, engineering and materials science, is represented and contrributes positively to the intellectual content of the Conference. Along with the opportunity to assess the field and future directions, it is expected that new ties will be established between universities, government research institutions, and industry.%%%An evaluation of the progress and status of Hot-Wire CVD Processing and related device issues along with current assessments of the most important developments will be of significant value to the understanding and enhanced utilization of electronic materials in computing, data processing, and communications. To promote and sustain the growth of such technologies, it is vital to attract the support, enthusiasm, and interest of young researchers and students. To this end, sessions will be held sequentially, and special efforts made to ensure information exchange in an informal setting. Leading scientists in the Si field have committed to attend the conference, so there will be opportunity for interactions between researchers of all levels of experience in Cat-CVD. ***