NER: Solvent Assisted Atomic Layer Deposition

未来的纳米级电子器件技术（包括先进的分子、生物和磁性器件）将使用比当前器件更广泛的材料。先进的设备还需要对不同材料之间界面的键合结构进行精细控制，这对工艺和加工条件提出了严格的要求。人们对原子层沉积（ALD）技术越来越感兴趣，这种技术能够在原子水平上控制沉积薄膜，从而在各种纳米尺度和纳米电子器件中实现感兴趣的材料的高度保形和光滑沉积。在这个项目中，我们打算证明使用溶剂化能作为一种新的可能的反应驱动力。在原子层沉积过程中。这一概念将被证明使用超临界溶剂（特别是二氧化碳），以促进减少金属有机前驱体吸附在沉积表面。为这项为期一年的工作选择的特定演示并不构成一个完全集成或可扩展的沉积过程。相反，该演示旨在展示在原子光滑的纳米级保形电子薄膜沉积中实现和利用溶剂化力效应来实现原子水平控制的可行性。成功的演示将促使更多的扩展工作，以实现更成熟、硬件密集型的沉积工具和方法，这些都超出了这个短期勘探项目的范围。这项工作最密切地解决了纳米尺度制造过程的主题。它具体解决了与以下相关的问题。小说的工具。对于纳米级的制造，开发纳米结构的高速合成和加工的新概念。纳米级合成和加工方法的规模化。该项目将利用PI，并以PI为基础。在薄膜沉积工艺的基础研究和实际演示方面具有丰富的经验。一个新的集成真空沉积/表征系统，具有广泛的表面表征工具，包括表面电子能谱和红外吸收能谱，可在PI。S实验室，并将用于演示和理解与所提议的过程相关的特定详细机制。这项工作将产生更广泛的影响，超出特定的研究结果。除了让参与该项目的研究生和博士后获得教育收益外，项目负责人还将利用这一努力来帮助拓展其研究生/本科生的化学工程课程。电子材料化学加工“，”讨论溶剂基工艺在纳米材料和器件制造中的可能应用。一个探索性的本科实验室也将被开发，以补充课程材料。

Future nano-scale electronic device technologies (including advanced molecular, biological, and magnetic devices) will utilize a much wider range of materials than found in current devices. Advanced devices will also require exquisite control over bond structure at interfaces between dissimilar materials, placing stringent demands on processes and processing conditions. There is growing interest in atomic layer deposition (ALD) techniques that enable atomic-level control over depositing thin films, to achieve highly conformal and smooth deposition of materials of interest in a variety of nano-scale and nano-electronic devices. For this project, we propose to demonstrate the use of solvation energy as a new possible reaction .driver. in an atomic layer deposition process. This concept will be demonstrated using a supercritical solvent (specifically CO2) to facilitate reduction of a metal-organic precursor adsorbed on a deposition surface. The particular demonstration chosen for this one-year effort does not constitute a completely integrated or scalable deposition process. Rather, the demonstration is designed to show feasibility of implementing and utilizing solvation force effects to achieve atomic level control in deposition of atomically smooth, nano-scale conformal electronic thin films. A successful demonstration will prompt more expanded work required to achieve more mature and hardware-intensive deposition tools and methods that are outside the scope of this short exploratory project. This work most closely addresses the theme of Manufacturing Processes at the Nanoscale. It specifically addresses issues related to .novel tools.for manufacturing at the nanoscale, developing novel concepts for high-rate synthesis and processing of nanostructures,.and scaleup of nanoscale synthesis and processing methods.. The project will take advantage of, and build upon, the PI.s experience in fundamental studies and practical demonstration of thin film deposition processes. A new integrated vacuum deposition/characterization system with a wide range of surface characterization tools, including surface electron spectroscopy and infrared absorption spectroscopy, is available in the PI.s lab, and will be used to demonstrate and understand the particular detailed mechanisms associated with the proposed process. This work will have broader impacts beyond the particular research results. In addition to the education benefit received by the graduate student and post-doc that will work on this project, the PI will use this effort to help expand his graduate/undergraduate Chemical Engineering course .Chemical Processing of Electronic Materials. to include discussion of possible applications of solvent-based processes in nano-scale materials and device fabrication. An exploratory undergraduate lab will also be developed that to supplement the course material.