Synthesis and applications of dispersible exfoliated metal oxide nanosheets fabricated by ALD

ALD法制备可分散剥离金属氧化物纳米片的合成及应用

基本信息

  • 批准号:
    1034374
  • 负责人:
  • 金额:
    $ 31.1万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Continuing Grant
  • 财政年份:
    2010
  • 资助国家:
    美国
  • 起止时间:
    2010-07-01 至 2014-06-30
  • 项目状态:
    已结题

项目摘要

1034374ParsonsIntellectual MeritThis research addresses the field of vapor-phase low temperature inorganic and organic thin film formation chemistry, to improve fundamental understanding and advance engineered system applications. It will expand fundamental knowledge in the field of low temperature chemical processes for amorphous and polycrystalline thin films, particularly in the field of low temperature atomic layer deposition (ALD). Atomic layer deposition utilizes vapor phase precursors in a binary surface reaction scheme to build up inorganic thin films with monolayer precision in film thickness. Most ALD material applications, including for example commercial high dielectric constant insulators in semiconductor logic devices, require films in excess of ~2 nanometers to achieve functional performance. This work will emphasize ALD growth initiation on receptive low temperature substrates, and explore the ultimate minimum thickness limits for self-cohesive surface-releasable ALD thin films. Research will seek to understand surface reaction mechanisms and substrate interactions during ALD processes to produce viable nano-layered semiconductors that can be released from a substrate and suspended in solution. The PI will also explore the fundamental properties of these materials in comparison with similar known materials formed by layered structure exfoliation, and examine how the new methods and materials can be used for beneficial impact. A particular application focus will be on anisotropic materials for photoelectrochemical water dissociation. This project will build on previous work, and the work on suspended nanosheets will initiate new research in a field that is not currently explored in the ALD or thin film deposition research community. There are several specific challenges, including designing ALD integration schemes and processes for self-cohesive ultrathin materials. The area of exfoliated nanosheets is sufficiently new, and the possible outcomes are sufficiently broad that the fundamental knowledge gained in this study will impact and expand the field of engineering of thin film deposition reactions. Broader ImpactThe project will promote teaching by allowing senior graduate students to mentor BS and more junior PhD students working in the lab. The PI plans to broaden participation by continuing to recruit students from underrepresented groups. The new research will enhance knowledge and research infrastructure in solar photoelectrochemistry, which is a growing area of interest at NC State and in the Research Triangle region in general. Results will be broadly disseminated by the students and PI in peer-reviewed journals and research conferences. The possible outcome of this work in new material processing schemes for economical solar-driven water electrolysis could provide significant beneficial impact to society in terms of energy and environment. The plans to advance basic understanding of ultra-thin film deposition will also impact a wide variety of fields, including advanced electronics, sensor technologies and other energy systems.
1034374部分智力价值这项研究致力于气相低温无机和有机薄膜形成化学领域的研究,以增进对基础知识的理解,促进工程系统的应用。它将扩展非晶和多晶薄膜低温化学工艺领域的基础知识,特别是在低温原子层沉积(ALD)领域。原子层沉积利用二元表面反应方案中的气相前驱体来建立具有单层精度的膜厚的无机薄膜。大多数ALD材料应用,包括例如半导体逻辑器件中的商用高介电常数绝缘体,都需要超过~2纳米的薄膜才能实现功能性能。这项工作将着重于在可接受的低温衬底上启动ALD的生长,并探索自粘结表面可释放的ALD薄膜的最终最小厚度限制。研究将寻求了解ALD过程中的表面反应机制和衬底相互作用,以生产可从衬底中释放并悬浮在溶液中的可行纳米层半导体。PI还将与通过层状结构剥离形成的类似已知材料进行比较,探索这些材料的基本性质,并研究如何使用新方法和材料产生有益影响。一个特别的应用重点将是用于光电化学水解离的各向异性材料。该项目将建立在以前工作的基础上,悬浮纳米片的工作将启动一个目前在ALD或薄膜沉积研究界尚未探索的领域的新研究。有几个具体的挑战,包括为自粘合超薄材料设计ALD集成方案和工艺。剥离纳米片的领域是足够新的,可能的结果是足够广泛的,在这项研究中获得的基础知识将影响和扩大薄膜沉积反应的工程领域。更广泛的影响该项目将通过允许高级研究生指导BS和更多在实验室工作的初级博士生来促进教学。国际和平协会计划通过继续从代表性不足的群体中招收学生来扩大参与范围。这项新的研究将加强太阳能光电化学方面的知识和研究基础设施,这是北卡罗来纳州和整个研究三角地区日益感兴趣的领域。结果将由学生和PI在同行评议的期刊和研究会议上广泛传播。这项工作可能产生的新材料加工方案的经济太阳能驱动的水电解可能会在能源和环境方面对社会产生重大的有益影响。推进对超薄膜沉积的基本了解的计划还将影响广泛的领域,包括先进的电子、传感器技术和其他能源系统。

项目成果

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Gregory Parsons其他文献

Issues in High-ĸ Gate Stack Interfaces
  • DOI:
    10.1557/mrs2002.73
  • 发表时间:
    2011-01-31
  • 期刊:
  • 影响因子:
    4.900
  • 作者:
    Veena Misra;Gerry Lucovsky;Gregory Parsons
  • 通讯作者:
    Gregory Parsons
Engineering Challenges in Molecular Electronics
分子电子学的工程挑战
  • DOI:
    10.1201/9781420007848.sec2
  • 发表时间:
    2002
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Gregory Parsons
  • 通讯作者:
    Gregory Parsons
Improving polymethacrylate EUV resists with TiO2 area-selective deposition
通过 TiO2 区域选择性沉积改进聚甲基丙烯酸酯 EUV 抗蚀剂
  • DOI:
  • 发表时间:
    2022
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Rachel A. Nye;Kaat Van Dongen;Hironori Oka;H. Furutani;Gregory Parsons;D. De Simone;A. Delabie
  • 通讯作者:
    A. Delabie
Disorder controlled sound speed and thermal conductivity of hybrid metalcone films
杂化金属锥膜的无序控制声速和热导率
  • DOI:
  • 发表时间:
    2024
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Md. Shafkat Bin Hoque;Rachel A. Nye;Saman Zare;Stephanie Atkinson;Siyao Wang;Andrew H. Jones;J. Gaskins;Gregory Parsons;Patrick E. Hopkins
  • 通讯作者:
    Patrick E. Hopkins

Gregory Parsons的其他文献

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{{ truncateString('Gregory Parsons', 18)}}的其他基金

Phase II IUCRC at North Carolina State University: Center for Dielectrics and Piezoelectrics
北卡罗来纳州立大学 IUCRC 第二阶段:电介质和压电中心
  • 批准号:
    1841466
  • 财政年份:
    2019
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Continuing Grant
Advanced Metal Thin Film Nucleation During Atomic Layer Deposition
原子层沉积过程中先进的金属薄膜成核
  • 批准号:
    1704151
  • 财政年份:
    2017
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
SNM: Continuous Vapor-Phase Processes for Nano-Functional Fibrous Materials Manufacturing
SNM:纳米功能纤维材料制造的连续气相工艺
  • 批准号:
    1344618
  • 财政年份:
    2013
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
AIR Option 1: Technology Translation - High-Throughput Roll-to-Roll Atmospheric Pressure Atomic Layer Deposition for Functional Nanocoatings on Porous and Flexible Materials
AIR 选项 1:技术转化 - 高通量卷对卷大气压原子层沉积,用于多孔和柔性材料上的功能性纳米涂层
  • 批准号:
    1312081
  • 财政年份:
    2013
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
Continuous Atmospheric Pressure Atomic Layer Deposition Process for Controlled Nanoscale Thin Film Coatings
受控纳米级薄膜涂层的连续大气压原子层沉积工艺
  • 批准号:
    1000382
  • 财政年份:
    2010
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
Integrated Molecular Layer Deposition and Atomic Layer Deposition of Organic and Inorganic Thin Films
有机和无机薄膜的集成分子层沉积和原子层沉积
  • 批准号:
    0626256
  • 财政年份:
    2006
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
NER: Solvent Assisted Atomic Layer Deposition
NER:溶剂辅助原子层沉积
  • 批准号:
    0304296
  • 财政年份:
    2003
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
Kinetics of Ultra-Thin Metal Oxide and Silicate Film Deposition on Silicon
硅上超薄金属氧化物和硅酸盐薄膜沉积动力学
  • 批准号:
    0072784
  • 财政年份:
    2000
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant
CAREER: Plasma Chemical Vapor Deposition of Amorphous Silicon Thin Films near Room Temperature Using Inert Ion Enhanced Processes
职业:使用惰性离子增强工艺在室温附近进行等离子化学气相沉积非晶硅薄膜
  • 批准号:
    9624612
  • 财政年份:
    1996
  • 资助金额:
    $ 31.1万
  • 项目类别:
    Standard Grant

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职业:结构化极小极大优化:稳健学习中的理论、算法和应用
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