MRI: Acquisition of Thin Film Low Pressure Chemical-Vapor Deposition (LPCVD) and Patterning Equipment

MRI：购置薄膜低压化学气相沉积 (LPCVD) 和图案化设备

• 批准号: 0421472
• 负责人: Yitshak Zohar
• 金额: $ 43.07万
• 依托单位: University of Arizona
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2004
• 资助国家: 美国
• 起止时间: 2004-07-15 至 2006-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0421472&HistoricalAwards=false
• 关键词: MRI; Acquisition; Thin; Film; Low

This Major Research Instrumentation (MRI) award provides funds for the acquisition of two systems: (i) photolithographic equipment for front- and back-side mask alignment, and (ii) Low Pressure Chemical-Vapor Deposition stack for thin film formation. The mask alignment and exposure system is used to align fabricated features in thin films sequentially formed either on the front side or the back side of a substrate to realize a complete microdevice. This is the process that allows the manufacturing of devices such as sensors and actuators, as well as integrated circuits, about a few micrometers in lateral dimensions. The deposition stack is used to for the deposition of thin films such as polycrystalline silicon, low-stress silicon nitride, low-temperature silicon dioxide and phosphosilicate glass. These are the most commonly used silicon-based thin films in MicroElectroMechanical Systems (MEMS) technology. This equipment will be used by both students and researchers to fabricate and characterize complete microsystems integrating electrical (transistors), mechanical (beams), optical (wave-guides), thermal (heaters), biological (proteins) and chemical components on a single chip.The acquisition of these systems is an essential component of the long-term plan of the University of Arizona to set-up a state-of-the-art micro/nano fabrication facility in support of its interdisciplinary teaching and research programs. The on-campus facility will allow researchers from various academic disciplines such as science, engineering and medicine to develop novel microdevices requiring selectively modified and photolithographically defined surface properties leading, particularly, to a unique synergy in the field of nano-bio-micro systems. The facility will support the education of under-graduate and graduate students in the areas of semiconductor processing, device manufacturing, micromachining, and nano science and technology. In the fast evolving technological scene, it is imperative to train the new generation of engineers and researchers with the most advanced equipment and techniques. Moreover, the facility will make a significant impact on product development being conducted by a large number of high-tech companies in the Southwest utilizing advanced semiconductor processing.

该主要研究仪器（MRI）奖项为两个系统的收购提供资金：（i）用于正面和背面掩模对准的光刻设备，以及（ii）用于薄膜形成的低压化学气相沉积堆栈。掩模对准和曝光系统用于对准在衬底的前侧或后侧上顺序形成的薄膜中的制造特征，以实现完整的微型器件。这是允许制造诸如传感器和致动器以及集成电路等横向尺寸约为几微米的设备的过程。该沉积堆叠用于沉积薄膜，例如多晶硅、低应力氮化硅、低温二氧化硅和磷硅酸盐玻璃。这些是微机电系统（MEMS）技术中最常用的硅基薄膜。该设备将被学生和研究人员用于制造和表征集成电气的完整微系统。（晶体管），机械（光束），光学（波导），热（加热器），生物（蛋白质）和化学成分在一个芯片上。这些系统的收购是亚利桑那大学长期计划的一个重要组成部分，该计划旨在建立一个最先进的微/纳米制造设施，以支持其跨学科的教学和研究计划。校园内的设施将允许来自科学，工程和医学等各个学科的研究人员开发需要选择性修改和几何定义的表面特性的新型微器件，特别是在纳米生物微系统领域的独特协同作用。该设施将支持本科生和研究生在半导体加工，器件制造，微机械加工和纳米科学技术领域的教育。在快速发展的技术领域，必须培养具有最先进设备和技术的新一代工程师和研究人员。此外，该设施将对西南地区大量利用先进半导体加工的高科技公司进行的产品开发产生重大影响。