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Collaborative Research: New Directions for Advanced VLSI Manufacturability

Collaborative Research: New Directions for Advanced VLSI Manufacturability
合作研究:先进 VLSI 可制造性的新方向
批准号:
0429630
负责人:
Andrew Kahng
金额:
$12.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-08-15 至 2008-07-31

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英文摘要
Proposal ID: 0429630PI/coPI: Gabriel Robins (UVA), Andrew Kahng (UCSD), Aleksandr Zelikovskiy (GA state)Title: Collaborative Research: New Directions for Advanced VLSI Manufacturability Abstract:As VLSI technology advances into ever shrinking design regimes and growing complexity, it is increasingly difficult to maintain adequate verification, process windows, and manufacturing yields. This project will investigate several newly critical issues at the interface between layout design and manufacturability, including automaticlayout flows for phase-shifting masks, area fill synthesis for yield improvement, gate-length biasing for leakage variability control, and principled methodologies for exploring restricted design rules. The Intellectual merit of our proposed research stems from its broad conceptualization of a future integrated design-to-manufacturing flow, coupled with its selective focus on several key design technology goals. This work will help alleviate some of the challenges that now threaten Moore's Law and the Semiconductor Technology Roadmap.
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