NER: Optimized Photonic Bandgap Devices with Nanoscale Disorder

NER：具有纳米级无序的优化光子带隙器件

基本信息

批准号：
0508473
负责人：
Harley Johnson
金额：
$ 10万
依托单位：
University of Illinois at Urbana-Champaign
依托单位国家：
美国
项目类别：
Standard Grant
财政年份：
2005
资助国家：
美国
起止时间：
2005-07-01 至 2007-06-30
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=0508473&HistoricalAwards=false
关键词：
NER Optimized Photonic Bandgap Devices

项目摘要

The objective of this work is to incorporate nanoscale disorder in a class of visible and near-infrared photonic crystal devices in order to achieve device figures of merit up to two orders of magnitude better than in existing state-of-the-art devices without nanoscale disorder. The approach is based on nonlinear topology optimization, whereby a 2D photonic crystal device can be designed so that the arrangement of dielectric material and air is optimally configured to yield some desired device output. Preliminary results show that, for example, a 2D photonic crystal waveguide with tailored nanoscale features near the crystal/air interface can exhibit focusing characteristics that significantly reduce losses in coupling to an external optical fiber. The necessary fabrication resolution to achieve such a device can be accommodated by advanced nanolithographic techniques. In this work, a similar photonic crystal device designed using topology optimization will be fabricated and characterized to validate and advance the approach.The broader technical impact of the work is to advance a novel and multidisciplinary solution to a significant limitation of real nanophotonic devices, potentially leading to a major breakthrough in photonic crystal device technology. The work also has significant broader impact in educating engineering students. As part of the work, the PI will help to develop an undergraduate course that will introduce mechanical engineering students to problems in electronic materials, and the project team will work to integrate senior design projects between the Mechanical Engineering and Electrical Engineering curricula at the University of Illinois at Urbana-Champaign.

这项工作的目的是将纳米级障碍纳入一类可见和近红外光子晶体设备中，以便获得比现有的没有纳米级障碍的现有最新的设备，以实现优异的数量级的功能数字。该方法基于非线性拓扑优化，因此可以设计2D光子晶体设备，以便最佳地配置了介电材料和空气以产生所需的设备输出。初步结果表明，例如，在晶体/空气界面附近具有量身定制的纳米级特征的2D光子晶体波导可以表现出焦点特征，从而显着减少耦合到外部光纤的损失。实现此类设备的必要制造分辨率可以通过先进的纳米光刻技术来容纳。在这项工作中，将制造并表征使用拓扑优化设计的类似的光子晶体设备，以验证和推进方法。这项工作的更广泛的技术影响是将新颖的多学科解决方案推进了对真实纳米光子设备的显着限制，这可能会导致光子晶体设备技术的主要突破。这项工作在教育工程专业的学生方面还具有更大的影响。作为工作的一部分，PI将有助于开发一门本科课程，该课程将向机械工程专业的学生介绍电子材料问题，项目团队将努力在伊利诺伊大学Urbana-Champaign的伊利诺伊大学机械工程和电气工程课程之间整合高级设计项目。