Atomistic Origins of Ion Bombardment Nanoscale Surface Instability

离子轰击纳米级表面不稳定性的原子起源

• 批准号: 0510624
• 负责人: Harley Johnson
• 金额: --
• 依托单位: University of Illinois at Urbana-Champaign
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-06-15 至 2009-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0510624&HistoricalAwards=false
• 关键词: Atomistic; Origins; Ion; Bombardment; Nanoscale

Atomistic Origins of Ion Bombardment Nanoscale Surface InstabilityNSF Proposal 0510624 to the Division of Civil and Mechanical SystemsPI: Harley T. Johnson; University of Illinois at Urbana-ChampaignAbstractThe objective of the program is to reveal, by means of computational observations at the atomic scale, how nanometer scale structures form during ion-bombardment processing of semiconductor surfaces. For many years this phenomenon has been observed experimentally, but the atomistic mechanisms driving this instability have never been well understood. This work has broad applications in nanomanufacturing and surface engineering for micro- and nanoelectronics.Using molecular dynamics simulations, the effects of many different variables on the spontaneous formation of nano-ripples and nano-dots will be investigated. Factors such as incident ion energy, incident ion angle, initial surface features, and stress, will be considered. By building a large database of molecular dynamics results, it will be possible to inform both the empirical continuum models and the extensive experimental observations of the ion bombardment nanoscale surface instability. The program will make use of several close collaborations with experimental groups studying ion bombardment in order to maximize the impact of the results.Beyond the broad technical impact in nanotechnology and electronics, the program has a strong educational mission. The program will support two graduate students, and the PI will participate in developing an undergraduate course in nanomechanics. Also, the PI and co-PI will introduce this research area to undergraduates at the University of Illinois through partnership with an NSF site program on campus. These activities will help to attract the best undergraduate and graduate students into nanoscale science and engineering and specifically to nanomanufacturing and surface engineering for micro- and nanoelectronics.

离子轰击的原子源纳米级表面不稳定性nsf提案0510624民用和机械系统Specsspi司：Harley T. Johnson；伊利诺伊大学在urbana-champaignabstractrats上的目标是通过原子尺度上的计算观察结果来揭示纳米尺度结构如何在半导体表面的离子障碍物处理过程中形成。多年来，这种现象一直在实验中观察到，但是驱动这种不稳定的原子机制从未得到充分理解。这项工作在微型和纳米电子学中具有广泛的应用。通过分子动力学模拟，将研究许多不同变量对纳米 - 纹状体和纳米点自发形成的影响。将考虑诸如入射离子能，入射离子角，初始表面特征和应力等因素。通过构建一个大型分子动力学结果数据库，可以将经验连续模型和对离子轰击的纳米级表面不稳定性的广泛实验观察告知。该计划将利用与研究离子轰炸的实验小组的几次密切合作，以最大程度地提高结果的影响。BEYOND对纳米技术和电子产品产生了广泛的技术影响，该计划具有强大的教育任务。该计划将支持两名研究生，PI将参与开发纳米力学的本科课程。此外，PI和Co-Pi将通过与校园的NSF网站计划合作，将该研究领域介绍该研究领域的本科生。这些活动将有助于吸引最佳的本科生和研究生进入纳米级科学和工程学，特别是用于微型和纳米电子学的纳米制造和表面工程。