GOALI: Polarized Infrared Imaging for the Mechanics of Photovoltaic Wafers
GOALI:用于光伏晶片力学的偏振红外成像
基本信息
- 批准号:1300466
- 负责人:
- 金额:$ 39.84万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2013
- 资助国家:美国
- 起止时间:2013-07-01 至 2017-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The research objective of this Grant Opportunity for Academic Liaison with Industry (GOALI) award is to investigate the mechanics of stress, defects, and failure in thin silicon photovoltaic wafers using a combination of infrared photoelasticity and polarized photoluminescence inspection techniques. Silicon wafers are the most common base material in solar cells, but due to stress and defects that arise during the crystal growth process, material losses during manufacturing remain a significant problem. Under support from this award, the relationship between stress and defects in photovoltaic wafers will be studied directly using lock-in infrared photoelasticity. Also, a new class of inspection techniques based on a lock-in polarized photoluminescence method, in which both intensity and polarization of emitted light is measured, will be developed and used to study the interaction of stress and defects with light absorbed or emitted by the material. Finally, the relationship between stress and failure in these materials will be investigated using a series of imaging and fracture experiments.The award will support a collaborative effort between university and industry researchers. The research could have significant impact in the solar energy industry, as it will help to explain the role of stress and defects in photovoltaic wafer failure, and could enable a pathway to rapid inspection and sorting of silicon photovoltaic wafers based on the probability of mechanical failure. The results will also add to the fundamental understanding of the interaction of light with defects in crystalline materials. In addition to the research objectives, the award will support graduate and undergraduate education and training. The academic/industry partnership will be highlighted by the annual summer placement of a graduate research assistant in the industry facility to learn characterization and manufacturing methods. Undergraduate students will be involved through an engineering outreach event at the University of Illinois, and through research in the laboratory of the Principle Investigator.
这项学术与工业联络资助机会(GOALI)奖的研究目标是利用红外光弹性和偏振光致发光检测技术的结合,研究薄硅光伏晶圆的应力、缺陷和失效机制。硅晶片是太阳能电池中最常见的基础材料,但由于晶体生长过程中产生的应力和缺陷,制造过程中的材料损失仍然是一个重大问题。在该奖项的支持下,将使用锁定红外光弹性直接研究光伏晶圆中的应力与缺陷之间的关系。此外,一种基于锁定偏振光致发光方法的新型检测技术将被开发出来,并用于研究应力和缺陷与材料吸收或发射的光的相互作用。最后,这些材料的应力和破坏之间的关系将通过一系列的成像和断裂实验来研究。该奖项将支持大学和行业研究人员之间的合作努力。该研究将对太阳能行业产生重大影响,因为它将有助于解释应力和缺陷在光伏晶圆失效中的作用,并为基于机械故障概率的硅光伏晶圆快速检测和分选提供途径。这些结果也将增加对晶体材料中光与缺陷相互作用的基本理解。除了研究目标之外,该奖项还将支持研究生和本科生的教育和培训。学术/行业合作伙伴关系将通过每年夏季安排一名研究生研究助理在行业设施中学习表征和制造方法来突出。本科生将参与伊利诺伊大学的工程推广活动,并在主要研究者的实验室进行研究。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Harley Johnson其他文献
Harley Johnson的其他文献
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{{ truncateString('Harley Johnson', 18)}}的其他基金
Illinois Materials Research Science and Engineering Center (I-MRSEC)
伊利诺伊州材料研究科学与工程中心 (I-MRSEC)
- 批准号:
2309037 - 财政年份:2023
- 资助金额:
$ 39.84万 - 项目类别:
Cooperative Agreement
Moire Patterns and the Mechanics of Defects and Interfaces in 2D Materials
二维材料中的莫尔图案以及缺陷和界面的力学
- 批准号:
1825300 - 财政年份:2018
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
Material Removal Mechanisms in Focused Ion Beam Nanopore Drilling
聚焦离子束纳米孔钻削中的材料去除机制
- 批准号:
1463587 - 财政年份:2015
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
Probing and optimizing quantum dot confined states for next generation intermediate band solar cells
探测和优化下一代中能带太阳能电池的量子点受限态
- 批准号:
0933348 - 财政年份:2009
- 资助金额:
$ 39.84万 - 项目类别:
Continuing Grant
Support for Student Programs at the 2008 Society of Engineering Science Annual Technical Meeting; held in October 2008, Urbana, IL
在2008年工程科学学会年度技术会议上支持学生项目;
- 批准号:
0834098 - 财政年份:2008
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
Bridging Time Scales with a Unit Process Approach for Modeling Ion Interactions with Materials
使用单元过程方法桥接时间尺度来模拟离子与材料的相互作用
- 批准号:
0825173 - 财政年份:2008
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
Collaborative Research: Focused Electric Field Induced Ion Transport: A Patterning Process
合作研究:聚焦电场诱导离子传输:图案化过程
- 批准号:
0700045 - 财政年份:2007
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
Quantitative Model-Based Photoelastic Characterization of Wafer-Bonding Stresses: a Tool for Industry and Education
基于定量模型的晶圆键合应力光弹性表征:工业和教育工具
- 批准号:
0700704 - 财政年份:2007
- 资助金额:
$ 39.84万 - 项目类别:
Continuing Grant
Atomistic Origins of Ion Bombardment Nanoscale Surface Instability
离子轰击纳米级表面不稳定性的原子起源
- 批准号:
0510624 - 财政年份:2005
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
NER: Optimized Photonic Bandgap Devices with Nanoscale Disorder
NER:具有纳米级无序的优化光子带隙器件
- 批准号:
0508473 - 财政年份:2005
- 资助金额:
$ 39.84万 - 项目类别:
Standard Grant
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