MRI: Development of a Deposition System for 3D Patterning of Molecular Materials in Vacuum
MRI:开发用于真空中分子材料 3D 图案化的沉积系统
基本信息
- 批准号:0521484
- 负责人:
- 金额:--
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2005
- 资助国家:美国
- 起止时间:2005-09-01 至 2010-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The proposed device is a standard vacuum flange compatible electrospray-based deposition unit ("MoleculeWriter"), capable of patterned deposition of molecular materials directly from solution in vacuum. The device utilizes the electrospray principle to inject molecular materials into high vacuum. Since electrospray generates an ionized molecular beam focusing and deflection by electromagnetic means becomes possible. This property will be used to generate a well-defined beam that can be directed to certain locations on the substrate, i.e. three-dimensional patterning becomes possible. Through computer control, arbitrary patterns can be generated. The materials that can be deposited with this system encompass a wide range of molecular entities as different in properties as luminescent polymers, proteins, functionalized nano-crystals, oligonucleotides, or supra-molecular species. The vacuum capability will enable fast solvent removal (i.e. prevent droplet related drying artifacts), precisely controlled, contamination-free deposition, and compatibility with established vacuum based deposition techniques (e.g. for metals and insulators) and surface preparation methods. Intersolubility issues will be dramatically reduced due to the vacuum environment, enabling the controlled deposition of three-dimensional multi-layered structures of materials soluble in the same solvent.The proposed program will focus on the simulation and construction of a system of suitable ion-optics to focus and deflect an electrospray injected molecular ion beam, the building of a prototype of the patterning device, its optimization, and the demonstration of its capabilities on a variety of molecular materials. It is planned to initially commercialize the device as an add-on system to existing vacuum equipment.The proposed work aims at the design and implementation of a device, which will be able to arrange nano-materials into well-defined three-dimensional structures on substrates. In order to utilize the special properties of nano-materials, methods need to be found to make structures from them, allowing the manufacture of nano-technology devices with practical uses, such as sensors or electronics. The proposed device will enable the patterning of nano-materials on a substrate in vacuum directly from a solution. The device will utilize the electrospray principle, to create a charged beam of the molecules separated from the solvent. The charges on the molecules can be used to focus and deflect the beam using electric and magnetic fields, so that the beam can be used to paint a defined pattern on a substrate in much the same way that an elctron beam paints a picture on a television screen. The proposed work will focus on the design and construction of a prototype of such a device, and its optimization and demonstration.
所提出的装置是标准真空法兰兼容的基于电喷雾的沉积单元(“MoleculeWriter”),其能够在真空中直接从溶液图案化沉积分子材料。该装置利用电喷雾原理将分子材料注入到高真空中。由于电喷雾产生电离的分子束,通过电磁手段聚焦和偏转成为可能。该特性将用于生成可以被引导到衬底上的某些位置的明确定义的光束,即三维图案化变得可能。通过计算机控制,可以生成任意图案。可以用该系统沉积的材料包括各种各样的分子实体,如发光聚合物、蛋白质、功能化纳米晶体、寡核苷酸或超分子物质。真空能力将实现快速溶剂去除(即防止与液滴相关的干燥伪影)、精确控制、无污染沉积以及与已建立的基于真空的沉积技术(例如用于金属和绝缘体)和表面制备方法的兼容性。由于真空环境,互溶性问题将大大减少,使可溶于同一溶剂的材料的三维多层结构的可控沉积成为可能。拟议的计划将集中在合适的离子光学系统的模拟和构建,以聚焦和偏转电喷雾注入的分子离子束,图案形成装置的原型的构建,其优化,并在各种分子材料上展示其能力。计划首先将该设备作为现有真空设备的附加系统进行商业化。拟议的工作旨在设计和实现一种设备,该设备将能够将纳米材料排列成基底上定义明确的三维结构。为了利用纳米材料的特殊性质,需要找到方法来制造它们的结构,从而制造具有实际用途的纳米技术设备,例如传感器或电子器件。所提出的设备将使纳米材料的图案在真空中直接从溶液的基板上。该装置将利用电喷雾原理,以产生从溶剂中分离的分子的带电束。分子上的电荷可以用来利用电场和磁场聚焦和偏转光束,这样光束就可以用来在基底上画出一个确定的图案,就像电子束在电视屏幕上画出一幅图像一样。拟议的工作将侧重于设计和建造这种装置的原型,以及其优化和演示。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
数据更新时间:{{ journalArticles.updateTime }}
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
数据更新时间:{{ journalArticles.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ monograph.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ sciAawards.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ conferencePapers.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ patent.updateTime }}
Rudiger Schlaf其他文献
Rudiger Schlaf的其他文献
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
{{ truncateString('Rudiger Schlaf', 18)}}的其他基金
GOALI: Efficiency Enhancement of Solar Cells Through Electronic Structure Design
目标:通过电子结构设计提高太阳能电池的效率
- 批准号:
1133239 - 财政年份:2011
- 资助金额:
-- - 项目类别:
Standard Grant
Bulk Heterostructure Solar Cells: Electronic Structure and Interface Design
体异质结构太阳能电池:电子结构和界面设计
- 批准号:
0906922 - 财政年份:2009
- 资助金额:
-- - 项目类别:
Standard Grant
Electrospray Deposition of Biosensor Substrates
生物传感器基底的电喷雾沉积
- 批准号:
0854354 - 财政年份:2009
- 资助金额:
-- - 项目类别:
Continuing Grant
High Work Function Back Contacts for CdTe Solar Cells
CdTe 太阳能电池的高功函数背接触
- 批准号:
0701861 - 财政年份:2007
- 资助金额:
-- - 项目类别:
Standard Grant
Investigation of Molecular Contacts and Interfaces
分子接触和界面的研究
- 批准号:
0510000 - 财政年份:2005
- 资助金额:
-- - 项目类别:
Continuing Grant
MRI: Acquisition of Focused Ion Beam Tool for the USF Nanomanufacturing and Nanomaterials Research Center
MRI:为 USF 纳米制造和纳米材料研究中心采购聚焦离子束工具
- 批准号:
0421238 - 财政年份:2004
- 资助金额:
-- - 项目类别:
Standard Grant
In-Vacuum Preparation and Characterization of Conductive Polymer Interfaces
导电聚合物界面的真空制备和表征
- 批准号:
0205577 - 财政年份:2002
- 资助金额:
-- - 项目类别:
Continuing Grant
GOALI: 2D High Resolution Dopant Profiling of Integrated Circuits Using Tapping Mode Atomic Force Microscopy
GOALI:使用轻敲模式原子力显微镜对集成电路进行二维高分辨率掺杂剂分析
- 批准号:
0010059 - 财政年份:2001
- 资助金额:
-- - 项目类别:
Standard Grant
相似国自然基金
水稻边界发育缺陷突变体abnormal boundary development(abd)的基因克隆与功能分析
- 批准号:32070202
- 批准年份:2020
- 资助金额:58 万元
- 项目类别:面上项目
Development of a Linear Stochastic Model for Wind Field Reconstruction from Limited Measurement Data
- 批准号:
- 批准年份:2020
- 资助金额:40 万元
- 项目类别:
相似海外基金
Development of resource efficient manufacturing process to produce sustainable hardmetal powders for laser Directed Energy Deposition
开发资源高效的制造工艺,生产用于激光定向能量沉积的可持续硬质合金粉末
- 批准号:
10072446 - 财政年份:2023
- 资助金额:
-- - 项目类别:
Grant for R&D
MRI: Development of Multi-Material Printing and Multi-Modal Sensing Capabilities for Directed Energy Deposition
MRI:开发用于定向能量沉积的多材料打印和多模态传感能力
- 批准号:
2216298 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Standard Grant
Metal deposition by liquid accelerated cold spray: process development and application
液体加速冷喷涂金属沉积:工艺开发与应用
- 批准号:
570560-2021 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Alliance Grants
A Foundational Step Towards the Development of a Predictive Framework for Particle Deposition in Wall-Bounded Turbulent Flows
开发壁面湍流中颗粒沉积预测框架的基础性步骤
- 批准号:
2219446 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Standard Grant
Development of Zirconia Dental Implant Material Gaining Titanium Ability Using Atomic Layer Deposition
利用原子层沉积开发获得钛能力的氧化锆牙科植入材料
- 批准号:
22K10046 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Grant-in-Aid for Scientific Research (C)
MRI: Development of A New High Temperature Source Metalorganic Chemical Vapor Deposition System (HTS-MOCVD) for Next Generation IIIA/B-Nitrides
MRI:开发用于下一代 IIIA/B 氮化物的新型高温源金属有机化学气相沉积系统 (HTS-MOCVD)
- 批准号:
2216107 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Standard Grant
Development of new processes based on a reactor-injector of nanoparticles for plasma deposition of multifunctional and sustainable nanocomposite coatings (RI-plasma)
开发基于纳米粒子反应器注射器的新工艺,用于等离子体沉积多功能和可持续纳米复合涂层(RI-等离子体)
- 批准号:
571852-2021 - 财政年份:2022
- 资助金额:
-- - 项目类别:
Alliance Grants
Understanding the role of catheter-associated protein deposition in the development of CAUTI
了解导管相关蛋白沉积在 CAUTI 发展中的作用
- 批准号:
10414282 - 财政年份:2021
- 资助金额:
-- - 项目类别:
Understanding the role of catheter-associated protein deposition in the development of CAUTI
了解导管相关蛋白沉积在 CAUTI 发展中的作用
- 批准号:
10399550 - 财政年份:2021
- 资助金额:
-- - 项目类别:
SBIR Phase I: Development of Continuous Micro Casting Deposition process for rotary targets manufacturing
SBIR 第一阶段:开发用于旋转靶材制造的连续微铸造沉积工艺
- 批准号:
2033721 - 财政年份:2021
- 资助金额:
-- - 项目类别:
Standard Grant