Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach

中间层光刻方法的理论、数值和实验研究

基本信息

  • 批准号:
    0654202
  • 负责人:
  • 金额:
    $ 30.47万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2007
  • 资助国家:
    美国
  • 起止时间:
    2007-06-15 至 2008-03-31
  • 项目状态:
    已结题

项目摘要

This project will establish a theoretical model and a numerical program for rationally patterning conducting polymers using a so-called intermediate-layer lithography (ILL) method. Preliminary experimental results, obtained through the support of a nano exploratory research grant, have demonstrated the feasibility of applying the ILL to pattern conducting polymers. On the other hand, a theoretical model, as well as a corresponding numerical program to solve the theoretical model, is needed to address experimental phenomena and direct experimental conduction. Fluorescent particles and quantum dots will be distributed on the substrates to find in-situ deformations of polymer patterns in the ranges of 2.5 microns to 1 millimeter and 50 nanometers to 2.5 microns, respectively. This deformation information will be used to verify and modify the theoretical and numerical models. In addition to conducting polymers, the ILL approach can also be applied to pattern metals as well as other types of polymers. In this sense, it is believed that if successful the ILL will become one of the major non-photolithographic approaches in generating polymer-based micro/nanosystems, and the systematic investigation of the ILL in this project will be a critical move to achieve this goal. The project will contribute to micro/nanotechnology education through new teaching modules, a new course, seminar presentations, and talks and forums at Grambling State University (a neighboring HBCU). This project will also focus on an effort to help K-12, undergraduate, and graduate students visualize micro/nanotechnology concepts, including establishment of a website which will have a database of rich visualization materials.
本项目将建立理论模型和数值程序,利用所谓的中间层光刻(ILL)方法对导电聚合物进行合理的图案化。在纳米探索性研究基金的支持下获得的初步实验结果表明,将ILL应用于图案导电聚合物是可行的。另一方面,需要一个理论模型,以及相应的数值程序来求解理论模型,以解决实验现象和直接实验传导。荧光粒子和量子点将分布在衬底上,分别在2.5微米至1毫米和50纳米至2.5微米范围内寻找聚合物图案的原位变形。这些变形信息将用于验证和修改理论和数值模型。除了导电聚合物外,ILL方法还可以应用于图案金属以及其他类型的聚合物。从这个意义上说,相信如果成功的话,ILL将成为产生聚合物基微/纳米系统的主要非光刻方法之一,而本项目中对ILL的系统研究将是实现这一目标的关键一步。该项目将通过新的教学模块、新课程、研讨会报告、以及在格兰布林州立大学(邻近的HBCU)举行的讲座和论坛,为微/纳米技术教育做出贡献。该项目还将致力于帮助K-12、本科生和研究生将微/纳米技术概念可视化,包括建立一个网站,该网站将拥有丰富的可视化材料数据库。

项目成果

期刊论文数量(0)
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Cheng Luo其他文献

Critical role of Lüders banding in hydrogen embrittlement susceptibility of medium Mn steels
Lüders 带在中锰钢氢脆敏感性中的关键作用
  • DOI:
    10.1016/j.scriptamat.2020.08.025
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    6
  • 作者:
    Jun Zhang;Mingxin Huang;Binhan Sun;Boning Zhang;Ran Ding;Cheng Luo;Wu Zeng;Chi Zhang;Zhigang Yang;Sybr;van der Zwaag;Hao Chen
  • 通讯作者:
    Hao Chen
Enhanced Low-Frequency Ride-Through for Speed-Sensorless Induction Motor Drives With Adaptive Observable Margin
具有自适应可观测裕度的无速度传感器感应电机驱动器的增强型低频穿越能力
Current Sensor Fault diagnosis for doubly-fed wind generator control system
双馈风力发电机控制系统电流传感器故障诊断
  • DOI:
    10.3923/itj.2013.4368.4373
  • 发表时间:
    2013-12
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Min Yan;Jing He;Cheng Luo;yuanyuan Xiao
  • 通讯作者:
    yuanyuan Xiao
Superfast degradation of refractory organic contaminants by ozone activated with thiosulfate: Efficiency and mechanisms
硫代硫酸盐活化臭氧超快降解难降解有机污染物:效率和机制
  • DOI:
    10.1016/j.watres.2020.115751
  • 发表时间:
    2020
  • 期刊:
  • 影响因子:
    12.8
  • 作者:
    Jingxin Yang;Cheng Luo;Tingting Li;Jie Cao;Wenyi Dong;Ji Li;Jun Ma
  • 通讯作者:
    Jun Ma
Altered functional connectivity networks in mesial temporal lobe epilepsy
内侧颞叶癫痫功能连接网络的改变
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    3.7
  • 作者:
    Wei Liao;Cheng Luo;Xujun Duan;Zhiqiang Zhang;Zhengyong Pan;Guangming Lu;Dante Mantini;Huafu Chen;Jurong Ding
  • 通讯作者:
    Jurong Ding

Cheng Luo的其他文献

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{{ truncateString('Cheng Luo', 18)}}的其他基金

Generation Of Sidewall Patterns Using A Thermal Shape-Memory Polymer
使用热形状记忆聚合物生成侧壁图案
  • 批准号:
    1030659
  • 财政年份:
    2010
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant
Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices
开发用于生成侧壁模板和聚合物纳米器件的纳米冲孔光刻方法
  • 批准号:
    0900595
  • 财政年份:
    2009
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
中间层光刻方法的理论、数值和实验研究
  • 批准号:
    0811888
  • 财政年份:
    2007
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
传感器:两种超高灵敏度悬浮硅纳米线传感器
  • 批准号:
    0822609
  • 财政年份:
    2007
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
传感器:两种超高灵敏度悬浮硅纳米线传感器
  • 批准号:
    0529104
  • 财政年份:
    2005
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant
NER: An Innovative Intermediate-Layer Lithography Approach For Patterning Conducting Polymers
NER:用于图案化导电聚合物的创新中间层光刻方法
  • 批准号:
    0508454
  • 财政年份:
    2005
  • 资助金额:
    $ 30.47万
  • 项目类别:
    Standard Grant

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