NER: An Innovative Intermediate-Layer Lithography Approach For Patterning Conducting Polymers
NER: An Innovative Intermediate-Layer Lithography Approach For Patterning Conducting Polymers
批准号:
0508454
负责人:
Cheng Luo
金额:
$8.28万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-07-01 至 2007-06-30
中文摘要
点击翻译按钮获取中文摘要
英文摘要
This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category Nanoscale Exploratory Research (NER). The objective of this NER research is to demonstrate the feasibility of generating conducting polymer wires down to 30nm. The approach is to first coat a non-conducting polymer intermediate layer between a substrate and a conducting polymer film and then pattern the conducting polymer layer through a mold insertion. The discovery of high conductivity in doped polyacetylene in 1971 (garnering the 2000 Nobel Prize in Chemistry for the three discovering scientists) has attracted considerable interest in the application of polymers as the semiconducting and conducting materials due to their promising potential to replace silicon and metals in building devices. However, existing techniques present significant technical challenges in producing conducting polymer microstructures, in particular, nanostructures. It is believed that this research will solve these challenges and suggest a dramatic change in the way that polymer devices and systems are created. Education and research, at both graduate and undergraduate levels, are deeply and mutually interdependent. This project will incorporate two new teaching modules into two courses that the principal investigator is teaching, "BioMEMS" and "Microfabrication Applications and Device Fabrication." In addition to international micro/nano manufacturing communities, this project will disseminate the information to Grambling State University (a neighboring minority-serving university) via two presentations and to K-12 schoolteachers and students through a so-call "potato action" (i.e., use the video clips to help visualize nanotechnology materials on a web site that will be established for this purpose).
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Generation Of Sidewall Patterns Using A Thermal Shape-Memory Polymer
-
批准号:1030659
-
项目类别:Standard Grant
-
资助金额:$30.0万
-
财政年份:2010
-
负责人:Cheng Luo
-
依托单位:
Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices
-
批准号:0900595
-
项目类别:Standard Grant
-
资助金额:$30.0万
-
财政年份:2009
-
负责人:Cheng Luo
-
依托单位:
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
-
批准号:0654202
-
项目类别:Standard Grant
-
资助金额:$30.47万
-
财政年份:2007
-
负责人:Cheng Luo
-
依托单位:
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
-
批准号:0811888
-
项目类别:Standard Grant
-
资助金额:$28.07万
-
财政年份:2007
-
负责人:Cheng Luo
-
依托单位:
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
-
批准号:0822609
-
项目类别:Standard Grant
-
资助金额:$10.07万
-
财政年份:2007
-
负责人:Cheng Luo
-
依托单位:
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
-
批准号:0529104
-
项目类别:Standard Grant
-
资助金额:$24.0万
-
财政年份:2005
-
负责人:Cheng Luo
-
依托单位:
海外基金