Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices

开发用于生成侧壁模板和聚合物纳米器件的纳米冲孔光刻方法

• 批准号: 0900595
• 负责人: Cheng Luo
• 金额: $ 30万
• 依托单位: University of Texas at Arlington
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-06-15 至 2013-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0900595&HistoricalAwards=false
• 关键词: Development; Nanopunching; Lithography; Method; Generating

This project will develop a nanopunching lithography (NPL) method for creating nanostructures and sidewall templates of sizes down to 30nm using a combination of theoretical, numerical and experimental investigations. A significant challenge in nanotechnology is to develop straightforward methods for organizing sub-100nm structures into functional architectures. Current micro/nanosystems mainly have a planar form. Therefore, sidewall templates are uniquely useful in guiding horizontal assembly of nanobuilding blocks, such as nanoparticles and molecules. Consequently, these nanobuilding blocks can be directly integrated into planar micro/nanosystems to serve as active components in these devices. The generation of sidewall templates calls for new lithographic approaches due to the limitations of existing lithographic approaches. Thus, under stimulation of a macropunching method commonly used in the industry to pattern sheet metals, an innovative lithographic approach (i.e., the NPL) is proposed to circumvent these two challenges. It will be uniquely suited to fabricating the sidewall templates, as well as polymer-based nanostructures. The capability of generating both architectures will lead to the production of polymer-based nanosystems of high functionality, as will be shown in generating transistors, contacts, and nanochannels. This project will focus on an effort to help K-12, undergraduate and graduate students visualize micro/nanotechnology concepts, including establishment of a website which will have a database of rich visualization materials. In addition, the PI is committed to furthering the involvement of undergraduate students and minorities in scientific research. He has track records in these activities, and will keep bringing these efforts to a much higher and broader level.

该项目将使用理论，数值和实验研究的组合，开发一种纳米启动光刻（NPL）方法，用于创建纳米结构和侧壁模板降低至30nm。纳米技术中的一个重大挑战是开发直接的方法，将亚100nm结构组织到功能架构中。当前的微/纳米系统主要具有平面形式。因此，侧壁模板在引导纳米塑料（例如纳米颗粒和分子）的水平组装方面非常有用。因此，这些纳米建筑块可以直接集成到平面微/纳米系统中，以作为这些设备中的活动组件。由于现有光刻方法的局限性，侧壁模板的产生要求采用新的光刻方法。因此，在刺激行业通常用于模式板金属的重大启动方法下，提出了一种创新的光刻方法（即NPL）来避免这两个挑战。它将非常适合制造侧壁模板以及基于聚合物的纳米结构。生成两种体系结构的能力将导致高功能高功能的基于聚合物的纳米系统的产生，这将在生成晶体管，触点和纳米渠道中显示。该项目将着重于帮助K-12，本科生和研究生可视化微/纳米技术概念，包括建立一个将拥有丰富可视化材料数据库的网站。此外，PI致力于促进本科生和少数民族参与科学研究。他在这些活动中有记录，并将继续将这些努力提高到更高和更广泛的水平。