Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices

开发用于生成侧壁模板和聚合物纳米器件的纳米冲孔光刻方法

• 批准号: 0900595
• 负责人: Cheng Luo
• 金额: $ 30万
• 依托单位: University of Texas at Arlington
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-06-15 至 2013-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0900595&HistoricalAwards=false
• 关键词: Development; Nanopunching; Lithography; Method; Generating

This project will develop a nanopunching lithography (NPL) method for creating nanostructures and sidewall templates of sizes down to 30nm using a combination of theoretical, numerical and experimental investigations. A significant challenge in nanotechnology is to develop straightforward methods for organizing sub-100nm structures into functional architectures. Current micro/nanosystems mainly have a planar form. Therefore, sidewall templates are uniquely useful in guiding horizontal assembly of nanobuilding blocks, such as nanoparticles and molecules. Consequently, these nanobuilding blocks can be directly integrated into planar micro/nanosystems to serve as active components in these devices. The generation of sidewall templates calls for new lithographic approaches due to the limitations of existing lithographic approaches. Thus, under stimulation of a macropunching method commonly used in the industry to pattern sheet metals, an innovative lithographic approach (i.e., the NPL) is proposed to circumvent these two challenges. It will be uniquely suited to fabricating the sidewall templates, as well as polymer-based nanostructures. The capability of generating both architectures will lead to the production of polymer-based nanosystems of high functionality, as will be shown in generating transistors, contacts, and nanochannels. This project will focus on an effort to help K-12, undergraduate and graduate students visualize micro/nanotechnology concepts, including establishment of a website which will have a database of rich visualization materials. In addition, the PI is committed to furthering the involvement of undergraduate students and minorities in scientific research. He has track records in these activities, and will keep bringing these efforts to a much higher and broader level.

该项目将开发一种纳米冲孔光刻 (NPL) 方法，通过结合理论、数值和实验研究来创建尺寸小至 30 nm 的纳米结构和侧壁模板。纳米技术的一个重大挑战是开发将亚 100 纳米结构组织成功能架构的简单方法。目前的微/纳米系统主要具有平面形式。因此，侧壁模板在引导纳米构件（例如纳米粒子和分子）的水平组装方面具有独特的作用。因此，这些纳米构件可以直接集成到平面微/纳米系统中，作为这些设备中的有源组件。由于现有光刻方法的局限性，侧壁模板的生成需要新的光刻方法。因此，在业界常用的金属板图案化宏观冲压方法的刺激下，提出了一种创新的光刻方法（即 NPL）来规避这两个挑战。它将特别适合制造侧壁模板以及基于聚合物的纳米结构。生成这两种架构的能力将导致生产基于聚合物的高功能纳米系统，如生成晶体管、触点和纳米通道所示。该项目将致力于帮助 K-12、本科生和研究生可视化微/纳米技术概念，包括建立一个拥有丰富可视化材料数据库的网站。此外，PI 致力于促进本科生和少数族裔参与科学研究。他在这些活动中拥有良好的记录，并将继续将这些努力提升到更高、更广泛的水平。