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Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach

Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
中间层光刻方法的理论、数值和实验研究
批准号:
0811888
负责人:
Cheng Luo
金额:
$28.07万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2007
资助国家:
美国
项目状态:
已结题
起止时间:
2007-09-01 至 2011-05-31

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中文摘要
翻译
本计画将建立一个理论模型与数值程式,以利用所谓的中间层微影法(ILL)来合理地图案化导电聚合物。初步的实验结果,通过纳米探索性研究补助金的支持下获得的,已经证明了ILL图案导电聚合物的应用的可行性。另一方面,理论模型,以及相应的数值程序来解决理论模型,需要解决实验现象和直接的实验传导。荧光颗粒和量子点将分布在基板上,以分别在2.5微米至1毫米和50纳米至2.5微米的范围内发现聚合物图案的原位变形。该变形信息将用于验证和修改理论和数值模型。除了导电聚合物之外,ILL方法还可以应用于图案化金属以及其他类型的聚合物。从这个意义上说,相信如果成功的话,ILL将成为产生基于聚合物的微/纳米系统的主要非线性方法之一,并且在该项目中对ILL的系统研究将是实现这一目标的关键步骤。该项目将通过新的教学模块、新的课程、研讨会演讲以及在格兰布林州立大学(邻近的HBCU)举行的会谈和论坛,为微/纳米技术教育做出贡献。该项目还将致力于帮助K-12,本科生和研究生可视化微/纳米技术概念,包括建立一个网站,其中将有丰富的可视化材料数据库。
英文摘要
This project will establish a theoretical model and a numerical program for rationally patterning conducting polymers using a so-called intermediate-layer lithography (ILL) method. Preliminary experimental results, obtained through the support of a nano exploratory research grant, have demonstrated the feasibility of applying the ILL to pattern conducting polymers. On the other hand, a theoretical model, as well as a corresponding numerical program to solve the theoretical model, is needed to address experimental phenomena and direct experimental conduction. Fluorescent particles and quantum dots will be distributed on the substrates to find in-situ deformations of polymer patterns in the ranges of 2.5 microns to 1 millimeter and 50 nanometers to 2.5 microns, respectively. This deformation information will be used to verify and modify the theoretical and numerical models. In addition to conducting polymers, the ILL approach can also be applied to pattern metals as well as other types of polymers. In this sense, it is believed that if successful the ILL will become one of the major non-photolithographic approaches in generating polymer-based micro/nanosystems, and the systematic investigation of the ILL in this project will be a critical move to achieve this goal. The project will contribute to micro/nanotechnology education through new teaching modules, a new course, seminar presentations, and talks and forums at Grambling State University (a neighboring HBCU). This project will also focus on an effort to help K-12, undergraduate, and graduate students visualize micro/nanotechnology concepts, including establishment of a website which will have a database of rich visualization materials.
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会议论文
Generation Of Sidewall Patterns Using A Thermal Shape-Memory Polymer
  • 批准号:
    1030659
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2010
  • 负责人:
    Cheng Luo
  • 依托单位:
Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices
  • 批准号:
    0900595
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    2009
  • 负责人:
    Cheng Luo
  • 依托单位:
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
  • 批准号:
    0654202
  • 项目类别:
    Standard Grant
  • 资助金额:
    $30.47万
  • 财政年份:
    2007
  • 负责人:
    Cheng Luo
  • 依托单位:
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
  • 批准号:
    0822609
  • 项目类别:
    Standard Grant
  • 资助金额:
    $10.07万
  • 财政年份:
    2007
  • 负责人:
    Cheng Luo
  • 依托单位:
海外基金