Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
批准号:
0811888
负责人:
Cheng Luo
金额:
$28.07万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2007
资助国家:
美国
项目状态:
已结题
起止时间:
2007-09-01 至 2011-05-31
中文摘要
该项目将建立一个使用所谓的中间层光刻(ILL)方法合理构图导电聚合物的理论模型和数值程序。在纳米探索性研究基金的支持下获得的初步实验结果证明了将ILL应用于导电聚合物模式化的可行性。另一方面,需要一个理论模型,以及相应的数值程序来求解理论模型,以解决实验现象和指导实验传导。荧光粒子和量子点将分布在衬底上,分别在2.5微米到1毫米和50纳米到2.5微米的范围内发现聚合物图案的原位变形。这些变形信息将用于验证和修改理论和数值模型。除了导电聚合物,病态方法也可以应用于图案金属以及其他类型的聚合物。从这个意义上说,如果成功,ILL将成为制备聚合物基微/纳米系统的主要非光刻方法之一,而本项目中对ILL的系统研究将是实现这一目标的关键一步。该项目将通过新的教学模块、新课程、研讨会报告以及在格拉姆林州立大学(邻近的HBCU)的讲座和论坛,为微/纳米技术教育做出贡献。该项目还将致力于帮助K-12、本科生和研究生将微/纳米技术的概念可视化,包括建立一个网站,该网站将拥有一个丰富的可视化材料数据库。
英文摘要
This project will establish a theoretical model and a numerical program for rationally patterning conducting polymers using a so-called intermediate-layer lithography (ILL) method. Preliminary experimental results, obtained through the support of a nano exploratory research grant, have demonstrated the feasibility of applying the ILL to pattern conducting polymers. On the other hand, a theoretical model, as well as a corresponding numerical program to solve the theoretical model, is needed to address experimental phenomena and direct experimental conduction. Fluorescent particles and quantum dots will be distributed on the substrates to find in-situ deformations of polymer patterns in the ranges of 2.5 microns to 1 millimeter and 50 nanometers to 2.5 microns, respectively. This deformation information will be used to verify and modify the theoretical and numerical models. In addition to conducting polymers, the ILL approach can also be applied to pattern metals as well as other types of polymers. In this sense, it is believed that if successful the ILL will become one of the major non-photolithographic approaches in generating polymer-based micro/nanosystems, and the systematic investigation of the ILL in this project will be a critical move to achieve this goal. The project will contribute to micro/nanotechnology education through new teaching modules, a new course, seminar presentations, and talks and forums at Grambling State University (a neighboring HBCU). This project will also focus on an effort to help K-12, undergraduate, and graduate students visualize micro/nanotechnology concepts, including establishment of a website which will have a database of rich visualization materials.
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专著(0)
科研奖励(0)
会议论文
Generation Of Sidewall Patterns Using A Thermal Shape-Memory Polymer
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批准号:1030659
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:2010
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负责人:Cheng Luo
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依托单位:
Development Of A Nanopunching Lithography Method For Generating Sidewall Templates And Polymer-Based Nanodevices
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批准号:0900595
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:2009
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负责人:Cheng Luo
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依托单位:
Theoretical, Numerical and Experimental Studies of an Intermediate-Layer Lithography Approach
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批准号:0654202
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项目类别:Standard Grant
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资助金额:$30.47万
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财政年份:2007
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负责人:Cheng Luo
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依托单位:
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
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批准号:0822609
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项目类别:Standard Grant
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资助金额:$10.07万
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财政年份:2007
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负责人:Cheng Luo
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依托单位:
Sensors: Two Types of Suspended-Silicon-Nanowire Based Sensors of Ultra-high Sensitivity
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批准号:0529104
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项目类别:Standard Grant
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资助金额:$24.0万
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财政年份:2005
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负责人:Cheng Luo
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依托单位:
NER: An Innovative Intermediate-Layer Lithography Approach For Patterning Conducting Polymers
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批准号:0508454
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项目类别:Standard Grant
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资助金额:$8.28万
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财政年份:2005
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负责人:Cheng Luo
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依托单位:
海外基金