NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
批准号:
0758508
负责人:
David Ruzic
金额:
$1.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-01-01 至 2008-12-31
中文摘要
将举行一次规划会议,调查伊利诺伊大学加入现有的工业/大学合作研究中心的激光和等离子体先进制造。 随着伊利诺伊大学在等离子体和激光相关的先进制造的背景下,该大学已经准备好在推进I/UCRC的目标和使命中发挥至关重要的作用,以进一步发展材料,设备和系统的激光和等离子体加工的科学,工程和技术基础。随着伊利诺伊大学加入I/UCRC,未来的研究将追求制造业大气等离子体的知识,空间推进,高功率脉冲磁控溅射和焊接使用以前开发的技术和开发新的和新颖的方法来研究和表征这些过程。
英文摘要
A planning meeting will be held to investigate the University of Illinois joining the existing Industry/University Cooperative Research Center for Lasers and Plasmas for Advanced Manufacturing. With the University of Illinois background in plasma and laser related advanced manufacturing, the university is well poised to play a vital role in advancing the goals and mission of the I/UCRC to further develop science, engineering, and technology base for laser and plasma processing of materials, devices, and systems.As the University of Illinois joins the I/UCRC, future research will pursue knowledge of atmospheric plasmas for manufacturing, space propulsion, high powered pulsed magnetron sputtering, and welding using previously developed techniques and developing new and novel ways to study and characterize these processes.
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会议论文
PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development
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批准号:1500271
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2015
-
负责人:David Ruzic
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依托单位:
I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
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批准号:1540030
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项目类别:Continuing Grant
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资助金额:$13.5万
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财政年份:2015
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负责人:David Ruzic
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依托单位:
GOALI: In-Situ Plasma Cleaning of Optics: Building a Fundamental Understanding of the Etch Process in a Complex Plasma Environment
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批准号:1436081
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项目类别:Standard Grant
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资助金额:$28.72万
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财政年份:2014
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负责人:David Ruzic
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依托单位:
Center for Lasers and Plasmas for Advanced Manufacturing
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批准号:0934400
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项目类别:Continuing Grant
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资助金额:$29.25万
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财政年份:2009
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负责人:David Ruzic
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依托单位:
Pulsed Electron-Beam-Generated Plasma Atomic-Layer Deposition (PEGPAD)
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批准号:9201689
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项目类别:Continuing Grant
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资助金额:$27.5万
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财政年份:1992
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负责人:David Ruzic
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依托单位:
Presidential Young Investigator Award: Plasma-Material Interactions
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批准号:8451599
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项目类别:Continuing Grant
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资助金额:$33.25万
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财政年份:1985
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负责人:David Ruzic
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依托单位:
海外基金