PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development

该PFI：AIR技术转换项目的重点是将物理气相沉积中使用的新磁场配置转换为用于许多应用的大规模矩形阴极。 TriPAC磁性排列非常重要，因为它允许新型高功率脉冲磁控溅射（HPPMS）实现与传统溅射源相同的沉积速率。 该项目将产生更高质量的涂层（更小的应力，更高的密度，更好的附着力），广泛影响许多不同的行业和研究领域-从消费品（剃须刀刀片）到能源生产（光电子）到半导体（显示器）到装饰涂层（浴室柜）。 该创新的优势在于仅使用永磁体产生新磁场的方式，并且整个组件可以适合常规磁体组件定位的磁控管的标准设计。 这些功能将允许在市场上轻松采用，并将允许HPPMS以具有成本效益的方式使用，与目前使用的标准磁体组相比。该项目解决了从研究发现到商业应用的以下技术差距。 这种新的磁场拓扑结构比现有的磁场工作得更好，因为它允许等离子体从阴极进一步膨胀，并提供不太陡峭的电位降。利用这种新的电场取向，离子化的溅射材料比传统的磁场配置更直接地朝向待涂覆的基板并用于更大量的膜沉积。 平均入射原子能量也增加了，进一步提高了薄膜致密化，使HPPMS技术对薄膜涂层更具吸引力。此外，参与该项目的人员，包括本科生、研究生和博士后学生，将通过看到这项发明变成商业产品来获得技术翻译经验。该项目聘请星火工业公司，一家专门从事弥合“死亡之谷”的小企业，将研究实验室的设计转化为可制造的产品，以及Kurt J. Lesker公司-这一领域的大型领先公司。 这种合作关系将使技术转化工作从研究发现走向商业现实。

This PFI: AIR Technology Translation project focuses on translating a new magnetic field configuration used in physical vapor deposition to large-scale rectangular cathodes used for many applications. The TriPAC magnetic arrangement is important because it allows a new type of high-power pulsed magnetron sputtering (HPPMS) to achieve the same deposition rates as conventional sputtering sources. The project will result in a higher quality coatings (less stress, higher density, better adhesion) broadly impacting many different industries and research areas- from consumer items (razor blades) to energy production (photovoltaics) to semiconductors (displays) to decorative coatings (bathroom faucets). The advantage of the innovation is the way the new magnetic field is generated, using only permanent magnets, and the whole assembly can fit into the standard design of magnetrons where conventional magnet assemblies are positioned. These features will allow easy adoption in the market place and will allow HPPMS to be used in a cost-effective manner compared to the standard magnet packs currently in use. This project addresses the following technology gaps as it translates from research discovery toward commercial application. This new magnetic field topology works better than current magnetic fields because it allows plasma to expand further from cathode and provides a less steep potential drop. With this new electric field orientation, ionized sputtered material is more directed towards substrate to be coated and utilized for film deposition in larger quantities than with the conventional magnetic field configuration. The average incident atom energy is also increased, further improving film densification and making the HPPMS technique more attractive for thin-film coatings. In addition, personnel involved in this project, undergraduate, graduate and post-doctoral students, will receive technology translation experiences through seeing this invention turn into a commercial product.The project engages Starfire Industries Inc., a small business specializing in bridging the "valley of death" to take the design which works in the research lab and turn it into a manufacturable product, and the Kurt J. Lesker Company - a large leading firm in this area. This partnership will enable the technology translation effort from a research discovery toward a commercial reality.