I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing

I/UCRC 第二期：先进制造激光和等离子体中心

• 批准号: 1540030
• 负责人: David Ruzic
• 金额: $ 13.5万
• 依托单位: University of Illinois at Urbana-Champaign
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-09-15 至 2020-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1540030&HistoricalAwards=false
• 关键词: UCRC; Phase; II; Center; Lasers

Both lasers and plasmas have the ability to alter a substance on contact. The key is to alter that substance to some particular aim; to create a new material, new product, or new technique. The U. of Illinois is part of the multi-university Industry/University Cooperative Research Center (I/UCRC) for Lasers and Plasmas for Advanced Manufacturing (LPAM) anchored at the U. of Virginia. The Center focuses on the next advances in manufacturing. U.S. country makes all kinds of things. This support from the NSF allows LPAM to continue working with industrial members to use the latest in laser and plasma technology to make those things better, or cheaper, or faster, or all three.The U. of Illinois's role in the Center is in specific uses of plasma engineering. The site brings a wide spectrum of plasmas and plasma manufacturing techniques, and works towards solving a multitude of research problems in plasma manufacturing that are both near-term and long-term. More specifically, the U. of Illinois focuses around development of large-scale plasma deposition system, directed etching assisted by lasers, and atmospheric plasma induced polymerization.

激光和等离子体都有在接触时改变物质的能力。关键是为了某个特定的目的而改变这种物质；创造一种新材料、新产品或新技术。伊利诺伊大学是设在弗吉尼亚大学的先进制造激光和等离子体(LPAM)多大学产业/大学合作研究中心(I/UCRC)的一部分。该中心专注于制造业的下一步进展。美国制造各种各样的东西。来自NSF的支持使LPAM能够继续与行业成员合作，使用最新的激光和等离子技术，使这些东西变得更好、更便宜、更快，或者三者兼而有之。伊利诺伊州大学在该中心的作用是在等离子体工程的特定用途。该网站提供了广泛的等离子和等离子制造技术，并致力于解决等离子体制造中的大量短期和长期研究问题。更具体地说，伊利诺伊州大学专注于大规模等离子体沉积系统、激光辅助直接蚀刻和大气等离子体诱导聚合的开发。