I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
批准号:
1540030
负责人:
David Ruzic
金额:
$13.5万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2015
资助国家:
美国
项目状态:
已结题
起止时间:
2015-09-15 至 2020-08-31
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Both lasers and plasmas have the ability to alter a substance on contact. The key is to alter that substance to some particular aim; to create a new material, new product, or new technique. The U. of Illinois is part of the multi-university Industry/University Cooperative Research Center (I/UCRC) for Lasers and Plasmas for Advanced Manufacturing (LPAM) anchored at the U. of Virginia. The Center focuses on the next advances in manufacturing. U.S. country makes all kinds of things. This support from the NSF allows LPAM to continue working with industrial members to use the latest in laser and plasma technology to make those things better, or cheaper, or faster, or all three.The U. of Illinois's role in the Center is in specific uses of plasma engineering. The site brings a wide spectrum of plasmas and plasma manufacturing techniques, and works towards solving a multitude of research problems in plasma manufacturing that are both near-term and long-term. More specifically, the U. of Illinois focuses around development of large-scale plasma deposition system, directed etching assisted by lasers, and atmospheric plasma induced polymerization.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development
-
批准号:1500271
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2015
-
负责人:David Ruzic
-
依托单位:
GOALI: In-Situ Plasma Cleaning of Optics: Building a Fundamental Understanding of the Etch Process in a Complex Plasma Environment
-
批准号:1436081
-
项目类别:Standard Grant
-
资助金额:$28.72万
-
财政年份:2014
-
负责人:David Ruzic
-
依托单位:
Center for Lasers and Plasmas for Advanced Manufacturing
-
批准号:0934400
-
项目类别:Continuing Grant
-
资助金额:$29.25万
-
财政年份:2009
-
负责人:David Ruzic
-
依托单位:
NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
-
批准号:0758508
-
项目类别:Standard Grant
-
资助金额:$1.0万
-
财政年份:2008
-
负责人:David Ruzic
-
依托单位:
Pulsed Electron-Beam-Generated Plasma Atomic-Layer Deposition (PEGPAD)
-
批准号:9201689
-
项目类别:Continuing Grant
-
资助金额:$27.5万
-
财政年份:1992
-
负责人:David Ruzic
-
依托单位:
Presidential Young Investigator Award: Plasma-Material Interactions
-
批准号:8451599
-
项目类别:Continuing Grant
-
资助金额:$33.25万
-
财政年份:1985
-
负责人:David Ruzic
-
依托单位:
国内基金
海外基金
登录
查看更多内容
Baryogenesis, Dark Matter and Nanohertz Gravitational Waves from a Dark
Supercooled Phase Transition
-
批准号:24ZR1429700
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2024
-
负责人:YUICHIRO NAKAI
-
依托单位:
ATLAS实验探测器Phase 2升级
-
批准号:11961141014
-
项目类别:国际(地区)合作与交流项目
-
资助金额:3350万元
-
批准年份:2019
-
负责人:刘衍文
-
依托单位:
地幔含水相Phase E的温度压力稳定区域与晶体结构研究
-
批准号:41802035
-
项目类别:青年科学基金项目
-
资助金额:12.0万元
-
批准年份:2018
-
负责人:张里
-
依托单位:
基于数字增强干涉的Phase-OTDR高灵敏度定量测量技术研究
-
批准号:61675216
-
项目类别:面上项目
-
资助金额:60.0万元
-
批准年份:2016
-
负责人:叶青
-
依托单位:
基于Phase-type分布的多状态系统可靠性模型研究
-
批准号:71501183
-
项目类别:青年科学基金项目
-
资助金额:17.4万元
-
批准年份:2015
-
负责人:陈童
-
依托单位:
纳米(I-Phase+α-Mg)准共晶的临界半固态形成条件及生长机制
-
批准号:51201142
-
项目类别:青年科学基金项目
-
资助金额:25.0万元
-
批准年份:2012
-
负责人:张英波
-
依托单位:
连续Phase-Type分布数据拟合方法及其应用研究
-
批准号:11101428
-
项目类别:青年科学基金项目
-
资助金额:23.0万元
-
批准年份:2011
-
负责人:黄卓
-
依托单位:
D-Phase准晶体的电子行为各向异性的研究
-
批准号:19374069
-
项目类别:面上项目
-
资助金额:6.4万元
-
批准年份:1993
-
负责人:张殿琳
-
依托单位: