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Center for Lasers and Plasmas for Advanced Manufacturing

Center for Lasers and Plasmas for Advanced Manufacturing
先进制造激光和等离子体中心
批准号:
0934400
负责人:
David Ruzic
金额:
$29.25万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-08-01 至 2015-07-31

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中文摘要
翻译
伊利诺伊大学香槟分校IIP 0934400伊利诺伊大学香槟分校(UIUC)计划加入现有的多所大学产业/大学合作研究中心(I/UCRC),该中心成立于2002年,名为“先进制造的激光和等离子中心”。该中心最初是作为一个单一的大学中心建立的,目前已发展成为一个多大学中心,有弗吉尼亚大学(Lead)、密歇根大学、安娜堡大学和南方卫理公会大学参与。该中心的主要研究重点一直是激光在先进制造中的应用。该中心的一些研究活动包括激光去除氧化物、激光微加工钛、激光微纹理、用于激光焊接的光学传感器、铝合金和碳纳米复合材料的微加工。UIUC的加入将加强该中心的等离子体部分,并带来更多样化的工业基础。UIUC的研究将涵盖广泛的等离子体和等离子制造技术,拟议的网站的研究计划将围绕三个研究重点:开发大规模等离子体沉积系统,激光辅助直接蚀刻,以及大气等离子体诱导聚合。此外,UIUC将致力于解决等离子体制造中的一系列短期和长期研究问题。UIUC的努力将把多年来与等离子体相关的研究扩展到快速扩大的激光/等离子体辅助制造领域。拟建的中心将为行业合作伙伴提供新的机会,因为短期和长期工程问题都得到了解决。行业合作伙伴可以利用这项技术开发新的市场,提高产品质量和性能,并降低制造成本。拟议的项目还为本科生和研究生提供了与行业合作的机会,并扩展了他们解决问题和研究的技能。研究结果将通过出版物和在知名期刊上发表来传播。UIUC还制定了博士后计划,以加强博士后体验。
英文摘要
IIP 0934400University of Illinois at Urbana-ChampaignRuzicUniversity of Illinois at Urbana-Champaign (UIUC) iis planning to join the existing multi-university Industry/University Cooperative Research Center (I/UCRC) entitled "The Center for Laser and Plasma for Advanced Manufacturing" which was created in 2002. The center was initially established as a single university center and currently has grown to a multi-university center with participation from the University of Virginia (lead), the University of Michigan, Ann Arbor and the Southern Methodist University. The primary focus of the center's research has been in laser applications for advanced manufacturing. Some of the center's research activities have included laser removal of oxides, laser micro-machining of titanium, laser microtexturing, optical sensor for laser welding, micromachining of aluminum alloys and carbon nanocomposites. The addition of UIUC would strengthen the plasma component of the center and bring in a more diverse industrial base. The research at UIUC will cover a wide spectrum of plasmas and plasma manufacturing techniques, and the proposed site's research plan will center around three research thrusts: development of large scale plasma deposition system, directed etching assisted by lasers, and atmospheric plasma induced polymerization. In addition, UIUC will work towards solving a multitude of research problems in plasma manufacturing that are both near-term and long-term. The effort at UIUC will broaden the many years of plasma-related research into the rapidly expanding arena of lasers/plasma assisted manufacturing. The proposed center will offer new opportunities for industry partners as both short term and long term engineering problems are solved. Industry partners can use the technology to develop new markets, improve product quality and performance, and reduce manufacturing costs. The proposed project also provides undergraduate and graduate students the opportunity to collaborate with industry, and expand their problem solving and research skills. Results of the research will be disseminated through publications and presentation in reputed journals. UIUC also has a postdoctoral plan in place to enhance the post-doc experience.
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会议论文
PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development
I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
GOALI: In-Situ Plasma Cleaning of Optics: Building a Fundamental Understanding of the Etch Process in a Complex Plasma Environment
NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
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