Center for Lasers and Plasmas for Advanced Manufacturing
Center for Lasers and Plasmas for Advanced Manufacturing
批准号:
0934400
负责人:
David Ruzic
金额:
$29.25万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-08-01 至 2015-07-31
中文摘要
伊利诺伊大学厄巴纳-香槟分校(UIUC)计划加入现有的多所大学产学研合作研究中心(I/UCRC),该中心名为“先进制造激光和等离子体中心”,该中心成立于2002年。该中心最初是作为一个单一的大学中心建立的,目前已经发展成为一个多所大学的中心,包括弗吉尼亚大学(领导)、密歇根大学、安娜堡大学和南卫理公会大学。该中心的主要研究重点是激光在先进制造业中的应用。该中心的一些研究活动包括激光去除氧化物、钛的激光微加工、激光微纹理、激光焊接的光学传感器、铝合金和碳纳米复合材料的微加工。UIUC的加入将加强该中心的等离子体成分,并带来更多样化的工业基础。伊利诺伊大学加州分校的研究将涵盖等离子体和等离子体制造技术的广泛领域,拟议的研究计划将围绕三个研究重点:大规模等离子体沉积系统的开发、激光辅助的定向蚀刻和大气等离子体诱导聚合。此外,UIUC将致力于解决大量近期和长期的等离子制造研究问题。UIUC的努力将把多年来与等离子体相关的研究扩展到快速扩展的激光/等离子体辅助制造领域。随着短期和长期工程问题的解决,拟议中的中心将为行业合作伙伴提供新的机会。行业合作伙伴可以使用该技术开发新市场,提高产品质量和性能,并降低制造成本。该项目还为本科生和研究生提供了与行业合作的机会,并扩展了他们解决问题和研究技能。研究结果将通过出版物和在知名期刊上发表文章来传播。UIUC还制定了博士后计划,以提高博士后体验。
英文摘要
IIP 0934400University of Illinois at Urbana-ChampaignRuzicUniversity of Illinois at Urbana-Champaign (UIUC) iis planning to join the existing multi-university Industry/University Cooperative Research Center (I/UCRC) entitled "The Center for Laser and Plasma for Advanced Manufacturing" which was created in 2002. The center was initially established as a single university center and currently has grown to a multi-university center with participation from the University of Virginia (lead), the University of Michigan, Ann Arbor and the Southern Methodist University. The primary focus of the center's research has been in laser applications for advanced manufacturing. Some of the center's research activities have included laser removal of oxides, laser micro-machining of titanium, laser microtexturing, optical sensor for laser welding, micromachining of aluminum alloys and carbon nanocomposites. The addition of UIUC would strengthen the plasma component of the center and bring in a more diverse industrial base. The research at UIUC will cover a wide spectrum of plasmas and plasma manufacturing techniques, and the proposed site's research plan will center around three research thrusts: development of large scale plasma deposition system, directed etching assisted by lasers, and atmospheric plasma induced polymerization. In addition, UIUC will work towards solving a multitude of research problems in plasma manufacturing that are both near-term and long-term. The effort at UIUC will broaden the many years of plasma-related research into the rapidly expanding arena of lasers/plasma assisted manufacturing. The proposed center will offer new opportunities for industry partners as both short term and long term engineering problems are solved. Industry partners can use the technology to develop new markets, improve product quality and performance, and reduce manufacturing costs. The proposed project also provides undergraduate and graduate students the opportunity to collaborate with industry, and expand their problem solving and research skills. Results of the research will be disseminated through publications and presentation in reputed journals. UIUC also has a postdoctoral plan in place to enhance the post-doc experience.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development
-
批准号:1500271
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2015
-
负责人:David Ruzic
-
依托单位:
I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
-
批准号:1540030
-
项目类别:Continuing Grant
-
资助金额:$13.5万
-
财政年份:2015
-
负责人:David Ruzic
-
依托单位:
GOALI: In-Situ Plasma Cleaning of Optics: Building a Fundamental Understanding of the Etch Process in a Complex Plasma Environment
-
批准号:1436081
-
项目类别:Standard Grant
-
资助金额:$28.72万
-
财政年份:2014
-
负责人:David Ruzic
-
依托单位:
NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
-
批准号:0758508
-
项目类别:Standard Grant
-
资助金额:$1.0万
-
财政年份:2008
-
负责人:David Ruzic
-
依托单位:
Pulsed Electron-Beam-Generated Plasma Atomic-Layer Deposition (PEGPAD)
-
批准号:9201689
-
项目类别:Continuing Grant
-
资助金额:$27.5万
-
财政年份:1992
-
负责人:David Ruzic
-
依托单位:
Presidential Young Investigator Award: Plasma-Material Interactions
-
批准号:8451599
-
项目类别:Continuing Grant
-
资助金额:$33.25万
-
财政年份:1985
-
负责人:David Ruzic
-
依托单位:
海外基金