Center for Lasers and Plasmas for Advanced Manufacturing
先进制造激光和等离子体中心
基本信息
- 批准号:0934400
- 负责人:
- 金额:$ 29.25万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2009
- 资助国家:美国
- 起止时间:2009-08-01 至 2015-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
IIP 0934400University of Illinois at Urbana-ChampaignRuzicUniversity of Illinois at Urbana-Champaign (UIUC) iis planning to join the existing multi-university Industry/University Cooperative Research Center (I/UCRC) entitled "The Center for Laser and Plasma for Advanced Manufacturing" which was created in 2002. The center was initially established as a single university center and currently has grown to a multi-university center with participation from the University of Virginia (lead), the University of Michigan, Ann Arbor and the Southern Methodist University. The primary focus of the center's research has been in laser applications for advanced manufacturing. Some of the center's research activities have included laser removal of oxides, laser micro-machining of titanium, laser microtexturing, optical sensor for laser welding, micromachining of aluminum alloys and carbon nanocomposites. The addition of UIUC would strengthen the plasma component of the center and bring in a more diverse industrial base. The research at UIUC will cover a wide spectrum of plasmas and plasma manufacturing techniques, and the proposed site's research plan will center around three research thrusts: development of large scale plasma deposition system, directed etching assisted by lasers, and atmospheric plasma induced polymerization. In addition, UIUC will work towards solving a multitude of research problems in plasma manufacturing that are both near-term and long-term. The effort at UIUC will broaden the many years of plasma-related research into the rapidly expanding arena of lasers/plasma assisted manufacturing. The proposed center will offer new opportunities for industry partners as both short term and long term engineering problems are solved. Industry partners can use the technology to develop new markets, improve product quality and performance, and reduce manufacturing costs. The proposed project also provides undergraduate and graduate students the opportunity to collaborate with industry, and expand their problem solving and research skills. Results of the research will be disseminated through publications and presentation in reputed journals. UIUC also has a postdoctoral plan in place to enhance the post-doc experience.
IIP 0934400伊利诺伊大学厄巴纳-香槟分校Ruzic伊利诺伊大学厄巴纳-香槟分校(UIUC)计划加入现有的多大学工业/大学合作研究中心(I/UCRC),名为“先进制造的激光和等离子体中心”,成立于2002年。 该中心最初是作为一个单一的大学中心建立的,目前已发展成为一个多大学中心,参与者包括弗吉尼亚大学(牵头)、密歇根大学、安阿伯和南卫理公会大学。 该中心的主要研究重点是激光在先进制造中的应用。该中心的一些研究活动包括激光去除氧化物,钛的激光微加工,激光微纹理,激光焊接的光学传感器,铝合金和碳纳米复合材料的微加工。UIUC的加入将加强该中心的血浆成分,并带来更多样化的工业基础。UIUC的研究将涵盖广泛的等离子体和等离子体制造技术,拟议的研究计划将围绕三个研究重点:大规模等离子体沉积系统的开发,激光辅助的定向蚀刻和大气等离子体诱导聚合。 此外,UIUC将致力于解决等离子体制造中的大量研究问题,这些问题既有短期的,也有长期的。 UIUC的努力将把多年来与等离子体相关的研究扩展到迅速扩大的激光/等离子体辅助制造竞技场。 拟建的中心将为行业合作伙伴提供新的机会,因为短期和长期的工程问题都得到了解决。行业合作伙伴可以利用该技术开发新市场,提高产品质量和性能,并降低制造成本。拟议的项目还为本科生和研究生提供了与行业合作的机会,并扩大了他们解决问题和研究技能。研究结果将通过出版物和在知名期刊上发表来传播。 UIUC也有一个博士后计划,以提高博士后经验。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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David Ruzic其他文献
Contact angle measurements of liquid lithium on surface-modified stainless steel, insulating materials, and other metals and coatings
- DOI:
10.1016/j.fusengdes.2024.114649 - 发表时间:
2024-11-01 - 期刊:
- 影响因子:
- 作者:
Steven Stemmley;Braden Moore;Cody Moynihan;Oren Yang;Kristin Skrecky;David Ruzic - 通讯作者:
David Ruzic
David Ruzic的其他文献
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{{ truncateString('David Ruzic', 18)}}的其他基金
PFI:AIR - TT: High-Rate High-Powered Pulsed Magnetron Sputtering (HPPMS) Prototype Development
PFI:AIR - TT:高速率高功率脉冲磁控溅射 (HPPMS) 原型开发
- 批准号:
1500271 - 财政年份:2015
- 资助金额:
$ 29.25万 - 项目类别:
Standard Grant
I/UCRC Phase II: Center for Lasers and Plasma for Advanced Manufacturing
I/UCRC 第二期:先进制造激光和等离子体中心
- 批准号:
1540030 - 财政年份:2015
- 资助金额:
$ 29.25万 - 项目类别:
Continuing Grant
GOALI: In-Situ Plasma Cleaning of Optics: Building a Fundamental Understanding of the Etch Process in a Complex Plasma Environment
目标:光学器件的原位等离子体清洗:建立对复杂等离子体环境中蚀刻过程的基本了解
- 批准号:
1436081 - 财政年份:2014
- 资助金额:
$ 29.25万 - 项目类别:
Standard Grant
NSF I/UCRC Joining" Center for Lasers and Plasmas for Advanced Manufacturing"
NSF I/UCRC 加入“先进制造激光和等离子体中心”
- 批准号:
0758508 - 财政年份:2008
- 资助金额:
$ 29.25万 - 项目类别:
Standard Grant
Pulsed Electron-Beam-Generated Plasma Atomic-Layer Deposition (PEGPAD)
脉冲电子束等离子体原子层沉积 (PEGPAD)
- 批准号:
9201689 - 财政年份:1992
- 资助金额:
$ 29.25万 - 项目类别:
Continuing Grant
Presidential Young Investigator Award: Plasma-Material Interactions
总统青年研究员奖:等离子体-材料相互作用
- 批准号:
8451599 - 财政年份:1985
- 资助金额:
$ 29.25万 - 项目类别:
Continuing Grant
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I/UCRC Phase III: Collaborative Research Program for I/UCRC for Lasers and Plasmas
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- 批准号:
1539853 - 财政年份:2015
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I/UCRC: Proposal to add North Carolina State University as a center site for the existing I/UCRC "Center for Lasers and Plasmas in Advanced Manufacturing"
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1362103 - 财政年份:2014
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$ 29.25万 - 项目类别:
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Collaborative proposal:NSF I/UCRC Joining "Center for Lasers and Plasmas for Advanced Manufacturing"
合作提案:NSF I/UCRC 加入“先进制造激光和等离子体中心”
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National Science Foundation Industry University Cooperative Research Center for Lasers and Plasmas for Advanced Manufacturing (LAM)
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