1.54 micron optical amplifiers and emitters based upon erbium doped III-nitrides grown on silicon
1.54 micron optical amplifiers and emitters based upon erbium doped III-nitrides grown on silicon
批准号:
0854619
负责人:
Hongxing Jiang
金额:
$32.8万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-08-15 至 2012-07-31
中文摘要
目的:本项目的目标是基于氮化硅光子材料系统,研制新型的硅基电泵浦光发射器和放大器。智力价值:近年来,硅光子学的研究受到了极大的关注,因为它具有利用成熟的硅加工技术的潜力。到目前为止,硅光子学面临的最大挑战是制造电动泵浦光源和放大器的难度。我们建议在硅上开发新型的光发射器和放大器。我们的方法是在III-氮化物半导体中利用Er(Er)掺杂,并基于我们通过MOCVD在硅上成功地合成了掺Er的III-氮化物器件结构,该结构在1.5微米的光通信中表现出主要的所需光发射。其技术目标是进一步发展MOCVD生长技术和器件制造技术,以便在硅基上生长的III-氮化物器件结构中原位掺入Er,从而实现1.5微米有源的掺Er氮化物光学放大器和发射器。更广泛的影响:对掺Er III-氮化物材料的基本了解以及此类材料在大面积硅衬底上的生长具有打开前所未有的应用的潜力,因为这种硅上氮化物光子材料系统将与标准的CMOS工艺兼容。研究生将积极参与一项具有高度跨学科性质的研究项目,涵盖从最先进的新型光子材料/结构的外延生长,到先进的材料表征,再到纳米级光子/光电子器件的制造。
英文摘要
Objective: The objective of this project is to develop new types of electrically pumped optical emitters and amplifiers on silicon based upon nitride-on-Si photonic materials system. Intellectual Merit: Research in silicon photonics has received much attention in recent years because of its potential to utilize well developed silicon processing technology. The foremost challenge in silicon photonics so far is the difficulty of making electrically pumped light sources and amplifiers. We propose to develop new types of optical emitters and amplifiers on silicon. Our approach is to exploit erbium (Er) doping in III-nitride semiconductors and is based on our successful synthesizing by MOCVD of Er-doped III-nitride device structures on silicon that exhibit predominantly the desired optical emission for optical communication at 1.5 microns. The technical aims are to further develop the MOCVD growth technology for the in-situ Er incorporation into III-nitride device structures grown on silicon and device fabrication technology for the realization of Er-doped nitride optical amplifiers and emitters active at 1.5 microns. Broader Impacts: The fundamental understanding of Er-doped III-nitride materials and the growth of such materials on large area Si substrates have the potential to open up unprecedented applications because such nitride-on-Si photonic materials system would be compatible with the standard CMOS processes. Graduate students will be actively involved in a research program that is highly interdisciplinary in nature; covering from the state-of-the-art epitaxial growth of novel photonic materials/structures, to advanced materials characterization, and to nano-scale photonic/optoelectronic device fabrication.
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Erbium Doped III-Nitrides for Optical Communications and Silicon Photonics
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批准号:1200168
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项目类别:Standard Grant
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资助金额:$39.0万
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财政年份:2012
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负责人:Hongxing Jiang
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依托单位:
ARI-MA: Collaborative Research: Hexagonal Boron Nitride Based Neutron Detectors
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批准号:1038700
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2010
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负责人:Hongxing Jiang
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依托单位:
1.54 micron optical amplifiers and emitters based upon erbium doped III-nitrides grown on silicon
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批准号:0823894
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项目类别:Standard Grant
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资助金额:$32.8万
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财政年份:2008
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负责人:Hongxing Jiang
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依托单位:
Advanced Semiconductor Research Group in the State of Kansas
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批准号:9977776
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项目类别:Standard Grant
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资助金额:$50.0万
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财政年份:1999
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负责人:Hongxing Jiang
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依托单位:
U.S.-China Cooperative Research: Fabrication and Optical Studies of GaN Microcavities
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批准号:9729582
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项目类别:Standard Grant
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资助金额:$7.3万
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财政年份:1998
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负责人:Hongxing Jiang
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依托单位:
Charge Storage and Persistent Photoconductivity in II-VI Semiconductor Alloys
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批准号:9118818
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项目类别:Continuing Grant
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资助金额:$16.5万
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财政年份:1992
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负责人:Hongxing Jiang
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依托单位:
海外基金