Advanced Semiconductor Research Group in the State of Kansas
Advanced Semiconductor Research Group in the State of Kansas
批准号:
9977776
负责人:
Hongxing Jiang
金额:
$50.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1999
资助国家:
美国
项目状态:
已结题
起止时间:
1999-08-15 至 2002-07-31
中文摘要
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英文摘要
Jiang EPS 9977776This project will establish an Interdisciplinary Research Group in advanced semiconductors in Kansas to forward research in the group III-nitride wide band gap semiconductors, a category of which is recognized as integral to the fabrication of certain optoelectronic and electronic devices capable of operating under high power and high temperature conditions. Despite the strong progress made in this research area, further problems still exist which have to do with materials quality and structure. Devices built with III-nitride materials will advance technological improvements in systems related to communications, transportation and energy. The integrative effort as represented in this project by the scientists and engineers from diverse backgrounds is necessary in order to develop innovative approaches to synthesizing materials, and developing state-of-the-art facilities and specialized instrumentation not achievable in a single investigator program. Commitment of NSF EPSCoR funds to this project will also reinforce further investments by universities and the State of Kansas in the area of advanced semiconductors.
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会议论文
Erbium Doped III-Nitrides for Optical Communications and Silicon Photonics
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批准号:1200168
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项目类别:Standard Grant
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资助金额:$39.0万
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财政年份:2012
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负责人:Hongxing Jiang
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依托单位:
ARI-MA: Collaborative Research: Hexagonal Boron Nitride Based Neutron Detectors
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批准号:1038700
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2010
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负责人:Hongxing Jiang
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依托单位:
1.54 micron optical amplifiers and emitters based upon erbium doped III-nitrides grown on silicon
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批准号:0854619
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项目类别:Standard Grant
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资助金额:$32.8万
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财政年份:2008
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负责人:Hongxing Jiang
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依托单位:
1.54 micron optical amplifiers and emitters based upon erbium doped III-nitrides grown on silicon
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批准号:0823894
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项目类别:Standard Grant
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资助金额:$32.8万
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财政年份:2008
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负责人:Hongxing Jiang
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依托单位:
U.S.-China Cooperative Research: Fabrication and Optical Studies of GaN Microcavities
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批准号:9729582
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项目类别:Standard Grant
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资助金额:$7.3万
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财政年份:1998
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负责人:Hongxing Jiang
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依托单位:
Charge Storage and Persistent Photoconductivity in II-VI Semiconductor Alloys
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批准号:9118818
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项目类别:Continuing Grant
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资助金额:$16.5万
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财政年份:1992
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负责人:Hongxing Jiang
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依托单位:
海外基金