MRI: Acquisition of an oxide molecular beam epitaxy system

MRI：获取氧化物分子束外延系统

• 批准号: 1126455
• 负责人: Susanne Stemmer
• 金额: $ 56.31万
• 依托单位: University of California-Santa Barbara
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2011
• 资助国家: 美国
• 起止时间: 2011-10-01 至 2014-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1126455&HistoricalAwards=false
• 关键词: MRI; Acquisition; oxide; molecular; beam

Technical AbstractResearch programs in oxides at the University of California, Santa Barbara (UCSB) span a wide range of applications, including as dielectrics, semiconductors, thermoelectrics and memristive devices. Many of these research activities are central to interdisciplinary programs and centers and all support graduate student education and training. These programs require oxide thin films with low defect densities, high purity, compatibility with active electronic device structures, low interface trap states and near-monolayer control over layer thicknesses. To address these needs, we propose to acquire a versatile, state-of-the-art oxide molecular beam epitaxy (MBE) system that will significantly expand capabilities for the synthesis of highly-perfect oxide thin films and structures, as needed to solve key problems in the development of new devices with oxides and in the materials physics of oxide structures. The project will contribute to advancing oxide MBE through the development of approaches to address issues such as stoichiometry control and poor volatility of constituents. In keeping with the tradition of UCSB's MBE Laboratory, the proposed oxide MBE system is designed to facilitate compatibility and accessibility and will be operated as a shared facility, impacting the training of a large number of students in interdisciplinary research programs at UCSB and at collaborating institutions. Graduate students and postdoctoral scholars are the primary users and oxide MBE will be the central focus of many Ph.D. dissertations. Two development engineers provide hands-on training in MBE while formal training is provided by a graduate course and weekly MBE seminars. The oxide MBE system will significantly expand research internship opportunities offered through education programs that target undergraduate and high-school students from underrepresented minority groups.Non-Technical AbstractResearch programs in oxide materials at the University of California, Santa Barbara (UCSB) span a wide range of applications, such as new electronic devices and energy conversion. Many of these research activities are central to interdisciplinary programs and centers and all support graduate student education and training. These programs require the deposition of thin film oxides with exceptionally low defect densities and high purity, comparable to what is now standard for conventional semiconductor materials. To address these needs, we propose to acquire a versatile, state-of-the-art molecular beam epitaxy (MBE) system for the deposition of thin film oxides. In keeping with the tradition of UCSB's MBE Laboratory, the proposed oxide MBE system will be operated as a shared facility, impacting the education and training of a large number of students in a wide range of interdisciplinary research programs at UCSB and at collaborating institutions. Graduate students and postdoctoral scholars are the primary users. Two development engineers provide hands-on training in MBE while formal training is provided by a graduate course and weekly MBE seminars. The oxide MBE system will significantly expand research internship opportunities offered through education programs that target undergraduate and high-school students from underrepresented minority groups.

加利福尼亚大学圣塔芭芭拉分校（UCSB）的氧化物的技术Abstractresearch计划涵盖了广泛的应用，包括AS介电，半导体，热电学和回忆设备。 这些研究活动中的许多是跨学科计划和中心的核心，所有这些研究活动都支持研究生的教育和培训。 这些程序需要氧化薄膜，具有低缺陷密度，高纯度，与主动电子设备结构的兼容性，低界面陷阱状态以及对层厚度的近单层控制。 为了满足这些需求，我们建议获取一种多功能的，最先进的氧化物分子束外延（MBE）系统，该系统将显着扩展能力，以综合高度完美的氧化物薄膜和结构，以解决与氧化物和氧化物材料的开发中的关键问题，以及氧化物的开发以及氧化物结构的材料。 该项目将通过开发方法来解决诸如化学计量控制和成分的波动性差的问题，从而有助于推进氧化物MBE。 为了符合UCSB的MBE实验室的传统，拟议的氧化物MBE系统旨在促进兼容性和可及性，并将作为共享设施运行，影响UCSB和协作机构中大量学生在跨学科研究计划中培训大量学生。 研究生和博士后学者是主要用户，氧化物MBE将成为许多博士学位的核心重点。论文。 两名开发工程师在MBE进行动手培训，同时由研究生课程和每周MBE研讨会提供正规培训。 氧化物MBE系统将大大扩大通过教育计划提供的研究实习机会，这些计划针对来自代表性不足的少数群体的本科和高中生。在加利福尼亚大学圣塔芭芭拉分校（UCSB）的氧化物材料中的非技术式Abstractresearch计划涵盖了广泛的应用，例如新型电子设备和能源设备和能源设备和能源设备。 这些研究活动中的许多是跨学科计划和中心的核心，所有这些研究活动都支持研究生的教育和培训。 这些程序需要沉积具有异常低的缺陷密度和高纯度的薄膜氧化物，与现在的常规半导体材料的标准相媲美。 为了满足这些需求，我们建议获取用于沉积薄膜氧化物的多功能，最先进的分子束外延（MBE）系统。 为了符合UCSB的MBE实验室的传统，拟议的氧化物MBE系统将作为共享设施运行，从而在UCSB和协作机构中影响大量跨学科研究计划的大量学生的教育和培训。 研究生和博士后学者是主要用户。 两名开发工程师在MBE进行动手培训，同时由研究生课程和每周MBE研讨会提供正规培训。 氧化物MBE系统将大大扩大通过教育计划提供的研究实习机会，该计划针对来自代表性不足的少数群体的本科生和高中生。