Nucleation and Growth of Thin Films and Nanostructures

薄膜和纳米结构的成核和生长

• 批准号: 1160195
• 负责人: John Ekerdt
• 金额: $ 30.54万
• 依托单位: University of Texas at Austin
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-06-01 至 2016-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1160195&HistoricalAwards=false
• 关键词: Nucleation; Growth; Thin; Films; Nanostructures

This research program investigates the nucleation and growth of metal nanoparticles and ultra thin metal films on amorphous substrates. Chemical growth methods will be studied that include chemical vapor deposition and atomic layer deposition. The research will focus on measuring the concentration and elucidating the chemical nature of defect sites on amorphous substrates were nucleation is initiated or where stable metal clusters are trapped. The program will probe the chemical nature of inherent defects and defects that are purposefully generated on the substrates. Fluorescent probe molecules designed to chemically titrate different proposed defect sites will be used to measure the concentration of the defects and possibly also their spatial distribution. The way the different defects affect nucleation and metal adatom trapping will be established. The research will also explore approaches to inhibit/block the growth of established metal islands and force a higher nucleation density as a route to smooth and ultra thin continuous films. The program will involve ruthenium, cobalt and tungsten metals, and silicon dioxide, aluminum oxide, and titanium dioxide as the supports. The overall objectives are to understand and describe the surface chemistry that allows metal nucleation to occur, and to determine if it is possible to control the growth of particles to maximize the nucleation density on the oxide substrate. Bonding and reactions at the substrate surface and at the film interface will be explored. Film composition and chemical bonding will be followed using X-ray photoelectron spectroscopy and low energy ion scattering spectroscopy. A full complement of characterization facilities will be used to study the films, including fluorimetry, atomic force microscopy, X-ray scattering spectroscopy, and high resolution electron microscopy.Intellectual Merit: Metal films find applications in sensors, optics and microelectronics, and as the critical dimensions or size of the applications and systems decrease, the metal films thickness also must decrease to tens of atomic diameters at most and must have a specific microstructure. Nanoparticles are used in advanced computer memory design, catalysis and quantum computing architectures; in all cases, there is a need to maximize the particle density and uniformity. This research is expected to develop a general understanding of how metal films and metal nanoparticles nucleate on amorphous oxide surfaces and initiate island growth. Nucleation and growth concepts are common to nanoparticles and polycrystalline films. The nucleation and growth issues explored transcend the material systems selected for this project.Broader Impacts: This research is motivated by the central role ultra thin metal films and nanoparticles on amorphous substrates have in applications such as electrodes, sensors, optics, thermal barriers, catalysts and diffusion barriers. There is an extensive literature pointing to the possible role of defects in nucleation and growth, however, there are few studies on amorphous surfaces that have measured and characterized the nature of these defects. This program seeks to use chemical probes designed to titrate the different defects. The fluorescence signal intensity suggest a sensitivity to 0.001 and possibly 0.0001 monolayers with these probes. If successful, the probes could be used to explore oxides more generally. Further this program addresses and seeks to describe the interfacial and surface reactions that affect the evolution of a film as it transforms from adsorbed adatoms to nucleated islands to a coalesced, continuous film.

本研究计画探讨金属奈米粒子及超薄金属薄膜在非晶基材上的成核与成长。化学生长方法将被研究，包括化学气相沉积和原子层沉积。该研究将侧重于测量浓度和阐明非晶衬底上的缺陷位置的化学性质，这些缺陷位置是成核开始的位置或稳定的金属团簇被捕获的位置。该计划将探讨固有缺陷和缺陷的化学性质是有目的地在基板上产生。设计用于化学滴定不同的建议缺陷位点的荧光探针分子将用于测量缺陷的浓度以及可能的空间分布。不同的缺陷影响形核和金属吸附原子捕获的方式将被建立。该研究还将探索抑制/阻止已建立的金属岛生长的方法，并迫使更高的成核密度作为平滑和超薄连续薄膜的途径。该计划将涉及钌，钴和钨金属，二氧化硅，氧化铝和二氧化钛作为载体。总体目标是理解和描述允许金属成核发生的表面化学，并确定是否有可能控制颗粒的生长以使氧化物衬底上的成核密度最大化。键合和反应在基板表面和薄膜界面将进行探讨。薄膜的组成和化学键合将使用X射线光电子能谱和低能离子散射谱。一整套表征设备将用于研究薄膜，包括荧光分析法、原子力显微镜、X射线散射光谱法和高分辨率电子显微镜。金属膜在传感器、光学和微电子学中有应用，并且随着应用和系统的关键尺寸或大小的减小，金属膜的厚度也必须最多减少到几十个原子直径，并且必须具有特定的微结构。纳米粒子用于先进的计算机存储器设计、催化和量子计算架构;在所有情况下，都需要最大限度地提高粒子密度和均匀性。这项研究有望发展的金属薄膜和金属纳米粒子如何在非晶氧化物表面成核和启动岛生长的一般理解。成核和生长概念对于纳米颗粒和多晶膜是共同的。所探索的成核和生长问题超越了本项目所选择的材料系统。更广泛的影响：这项研究的动机是非晶基底上的超薄金属薄膜和纳米颗粒在电极、传感器、光学、热屏障等应用中发挥的核心作用。催化剂和扩散屏障。有大量的文献指出缺陷在成核和生长中的可能作用，然而，很少有对非晶表面的研究已经测量和表征了这些缺陷的性质。该计划旨在使用化学探针来滴定不同的缺陷。荧光信号强度表明这些探针对0.001和可能0.0001单层的灵敏度。如果成功的话，这些探测器可以用来探测更普遍的氧化物。此外，该计划的地址，并试图描述的界面和表面反应，影响膜的演变，因为它从吸附的吸附原子转化成核岛的聚结，连续的膜。