InAs-based nanowires on silicon platform for novel nanoscale high electron mobility heterojunction devices
InAs-based nanowires on silicon platform for novel nanoscale high electron mobility heterojunction devices
批准号:
212579533
负责人:
Privatdozent Dr. Gregor Koblmüller
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2012
资助国家:
德国
项目状态:
已结题
起止时间:
2011-12-31 至 2015-12-31
中文摘要
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英文摘要
Central objective of this project is the realization of advanced InAs nanowire (NW)-based high electron mobility devices fabricated by catalyst-free, site-selective molecular beam epitaxy, with a focus on vertical surround gate (VSG) tunnel-junction field effect transistors (TJ-NWFET) on silicon. Two complementary directions will be targeted: (a) microstructure-electrical transport property correla-tions in back-gated InAs NWFETs to identify the role of structural defects, distinct crystal phases and dopants, and set the base for optimized NW structures implemented into (b) high-performance InAs VSG-TJ-NWFETs, including core-shell high electron mobility transistor (HEMT) devices. The micro-structure-electrical transport studies will be conducted via gated 2-(4)-terminal current-voltage (I-V) measurements (temperature- and electric field-dependent), as well as by spatially resolved electrical scanning probe microscopy techniques. For the VSG-TJ-NWFET architectures on Si large emphasis will be on carrier transport across the InAs-Si tunnel junction (inter-band tunneling characteristics, negative differential resistance, etc.) controlled by band tuning mainly via doping, and investigated in reverse and forward bias conditions to derive the characteristic junction quality properties. Further-more, undoped and modulation-doped In(Ga,Al)As-InAs core-shell HEMT structures are designed for enhanced carrier confinement inside the NW core and suppression of surface scattering. These structures will be studied by the full spectrum of materials characterization methods, as well as theoretical model calculations of electronic transport of confined charge carriers in 1D/2DEG core-shell NW systems. This project may not only provide interesting insights into the performance of not yet investigated MBE-grown InAs NWFETs, but may open up also new directions for future development of InAs NW-based diode applications, such as photovoltaic and photodetection devices.
期刊论文(14)
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DOI:
10.1063/1.4768001
发表时间:
2012-12
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Tao Yang;S. Hertenberger;S. Morkötter;G. Abstreiter;G. Koblmüller]
通讯作者:
Tao Yang;S. Hertenberger;S. Morkötter;G. Abstreiter;G. Koblmüller
DOI:
10.1021/acsnano.5b03017
发表时间:
2015-09
期刊:
ACS nano
影响因子:
17.1
作者:
[A. Brenneis;Jan Overbeck;J. Treu;S. Hertenberger;S. Morkötter;M. Döblinger;J. Finley;G. Abstreiter;G. Koblmüller;A. Holleitner]
通讯作者:
A. Brenneis;Jan Overbeck;J. Treu;S. Hertenberger;S. Morkötter;M. Döblinger;J. Finley;G. Abstreiter;G. Koblmüller;A. Holleitner
DOI:
10.1021/nl403341x
发表时间:
2013-11
期刊:
Nano letters
影响因子:
10.8
作者:
[J. Treu;M. Bormann;H. Schmeiduch;M. Döblinger;S. Morkötter;S. Matich;P. Wiecha;K. Saller;B. Mayer;M. Bichler;M. Amann;J. Finley;G. Abstreiter;G. Koblmüller]
通讯作者:
J. Treu;M. Bormann;H. Schmeiduch;M. Döblinger;S. Morkötter;S. Matich;P. Wiecha;K. Saller;B. Mayer;M. Bichler;M. Amann;J. Finley;G. Abstreiter;G. Koblmüller
DOI:
10.1021/nl403561w
发表时间:
2013-12
期刊:
Nano letters
影响因子:
10.8
作者:
[S. Funk;M. Royo;I. Zardo;D. Rudolph;S. Morkötter;B. Mayer;J. Becker;A. Bechtold;S. Matich;M. Döblinger;M. Bichler;G. Koblmüller;J. Finley;A. Bertoni;G. Goldoni;G. Abstreiter]
通讯作者:
S. Funk;M. Royo;I. Zardo;D. Rudolph;S. Morkötter;B. Mayer;J. Becker;A. Bechtold;S. Matich;M. Döblinger;M. Bichler;G. Koblmüller;J. Finley;A. Bertoni;G. Goldoni;G. Abstreiter
DOI:
10.1088/0957-4484/23/23/235602
发表时间:
2012-06-15
期刊:
NANOTECHNOLOGY
影响因子:
3.5
作者:
[Hertenberger, S., Rudolph, D., Koblmueller, G.]
通讯作者:
Koblmueller, G.
共 7 条
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