I-Corps: Hexagonal Boron Nitride for Electronic Devices

I-Corps:用于电子设备的六方氮化硼

基本信息

  • 批准号:
    1339054
  • 负责人:
  • 金额:
    $ 5万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2013
  • 资助国家:
    美国
  • 起止时间:
    2013-05-01 至 2014-04-30
  • 项目状态:
    已结题

项目摘要

The potential for further development of hexagonal boron nitride (hBN) single crystals will be explored. Single crystals of hBN are potentially transformative materials because of their unique properties and applications as a graphene substrate, a neutron detector, and as UV-LED semiconductors. Some of the unique properties of hBN include its ability to emit deep-UV light (as low as 215 nm), its large thermal neutron capture cross section (due to the strong interaction between thermal neutrons (~25 meV) and the 20% naturally occurring boron-10 isotope), and a crystal structure that is similar to graphene (including the smallest known lattice mismatch of only +1.7%), making it an excellent substrate for graphene. However, electronic and optoelectronic device applications exploiting these properties have been hampered by the small size, poor crystal quality, and high impurity content commercially available hBN. The hBN single crystals produced in this project could enable the development of new types of devices exploiting its properties including deep-UV emitters (for non-thermal sterilization and water purification), solid state neutron detectors (for homeland security, first responders, and treaty verification), and as an excellent electrically insulating substrate for grapheme integrated electronics and sensors. This project will explore the widespread use and practical application opportunities afforded by these hBN single crystals with the goal of manufacturing the crystals on a large scale.
六方氮化硼单晶的进一步发展潜力将被探索。hBN的单晶是潜在的变革性材料,因为它们作为石墨烯衬底、中子探测器和UV-LED半导体的独特性质和应用。hBN的一些独特性质包括其发射深紫外光的能力(低至215 nm),其大的热中子俘获截面(由于热中子(~25 meV)和20%天然存在的硼-10同位素之间的强烈相互作用),以及类似于石墨烯的晶体结构(包括已知最小的晶格失配,仅为+1.7%),使其成为石墨烯的优良基底。然而,利用这些性质的电子和光电器件应用受到小尺寸、差的晶体质量和高杂质含量的市售hBN的阻碍。在该项目中生产的hBN单晶可以开发利用其特性的新型设备,包括深紫外发射器(用于非热灭菌和水净化),固态中子探测器(用于国土安全,第一响应者和条约验证),以及作为石墨烯集成电子器件和传感器的优良电绝缘衬底。该项目将探索这些hBN单晶所提供的广泛用途和实际应用机会,目标是大规模制造晶体。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)

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James Edgar其他文献

Vapor Crystal Growth and Characterization: ZnSe and Related II–VI Compound Semiconductors by Ching-Hua Su Springer, 2020 215 pages, $139.99 ISBN 978-3-030-39654-1
  • DOI:
    10.1557/mrs.2020.218
  • 发表时间:
    2020-10-04
  • 期刊:
  • 影响因子:
    4.900
  • 作者:
    James Edgar
  • 通讯作者:
    James Edgar

James Edgar的其他文献

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{{ truncateString('James Edgar', 18)}}的其他基金

Intergovernmental Mobility Assignment
政府间流动分配
  • 批准号:
    1943430
  • 财政年份:
    2019
  • 资助金额:
    $ 5万
  • 项目类别:
    Intergovernmental Personnel Award
Hexagonal Boron Nitride Crystal Growth from Solution: A Study of Fundamentals
溶液中生长六方氮化硼晶体:基础研究
  • 批准号:
    1538127
  • 财政年份:
    2015
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant
ARI-MA: Collaborative Research: Hexagonal Boron Nitride Based Neutron Detectors
ARI-MA:合作研究:六方氮化硼基中子探测器
  • 批准号:
    1038890
  • 财政年份:
    2010
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant
MRI: Acquisition of a Field Emission Scanning Electron Microscope for Kansas State University
MRI:为堪萨斯州立大学购买场发射扫描电子显微镜
  • 批准号:
    0923499
  • 财政年份:
    2009
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant
ARI-SA: Boron-rich semiconductors for neutron detectors
ARI-SA:用于中子探测器的富硼半导体
  • 批准号:
    0736154
  • 财政年份:
    2007
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant
MRI: Aquisition of a Hall Effect Measurement System for Characterizing Novel Semiconductors
MRI:获取用于表征新型半导体的霍尔效应测量系统
  • 批准号:
    0619423
  • 财政年份:
    2006
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant
Materials World Network: Collaborative Research: An Investigation into the Properties of B12As2, B4C and their Heterostructures
材料世界网络:合作研究:B12As2、B4C 及其异质结构特性的研究
  • 批准号:
    0602807
  • 财政年份:
    2006
  • 资助金额:
    $ 5万
  • 项目类别:
    Continuing Grant
Collaborative Research: Analysis of Defects and Their Causes in Bulk Aluminum Nitride Crystals
合作研究:块状氮化铝晶体的缺陷及其原因分析
  • 批准号:
    0408874
  • 财政年份:
    2004
  • 资助金额:
    $ 5万
  • 项目类别:
    Continuing Grant
Synthesis and Characterization of Silicon Carbide - Group III Nitrides Layered Structures and Alloys
碳化硅-III族氮化物层状结构及合金的合成与表征
  • 批准号:
    9627333
  • 财政年份:
    1996
  • 资助金额:
    $ 5万
  • 项目类别:
    Continuing Grant
Improved Silicon Carbide on Silicon Crystal Quality by Epitaxial Necking
通过外延颈缩提高碳化硅硅晶体质量
  • 批准号:
    9319770
  • 财政年份:
    1994
  • 资助金额:
    $ 5万
  • 项目类别:
    Standard Grant

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